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Merck
过氧化氢 溶液 contains potassium stannate as inhibitor, 30-32 wt. % in water, semiconductor grade, 99.999% trace metals basis

过氧化氢 溶液

过氧化氢 溶液 contains potassium stannate as inhibitor, 30-32 wt. % in water, semiconductor grade, 99.999% trace metals basis
同義詞:
过氧化氢 溶液, Hydrogen peroxide solution
經驗公式（希爾表示法）:
H2O2
CAS號碼:
7722-84-1
分子量：:
34.01

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216763

过氧化氢 溶液, contains inhibitor, 30 wt. % in H2O, ACS reagent

H1009

过氧化氢 溶液, 30 % (w/w) in H2O, contains stabilizer

516813

过氧化氢 溶液, 50 wt. % in H2O, stabilized

31642

过氧化氢 溶液, 30% (w/w), puriss. p.a., reag. ISO, reag. Ph. Eur.

1.07298

过氧化氢 溶液, 30%, Suprapur®

8.22287

过氧化氢 溶液, 30%, (stabilized) for synthesis

349887

过氧化氢 溶液, contains inhibitor, 35 wt. % in H2O

323381

过氧化氢 溶液, contains ~200 ppm acetanilide as stabilizer, 3 wt. % in H2O

95299

过氧化氢 溶液, purum p.a., ≥35% (RT)

88597

过氧化氢 溶液, 3%, suitable for microbiology

18304

过氧化氢 溶液, 34.5-36.5%

H3410

过氧化氢 溶液, contains inhibitor, 30 wt. % in H2O, meets USP testing specifications

95321

过氧化氢 溶液, ≥30%, for trace analysis

16911

过氧化氢 溶液, 30 % (w/w), for ultratrace analysis

95294

过氧化氢 溶液, tested according to Ph. Eur.

316989

过氧化氢 溶液, contains potassium stannate as inhibitor, 30-32 wt. % in water, semiconductor grade, 99.999% trace metals basis