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About This Item
線性公式:
Cu(C5H7O2)2
CAS號碼:
分子量：:
261.76
Beilstein:
4157957
EC號碼:
MDL號碼:
分類程式碼代碼:
12352103
PubChem物質ID:
NACRES:
NA.23
推薦產品
化驗
97%
形狀
powder
反應適用性
core: copper
reagent type: catalyst
mp
284-288 °C (dec.) (lit.)
SMILES 字串
CC(=O)\C=C(\C)O[Cu]O\C(C)=C/C(C)=O
InChI
1S/2C5H8O2.Cu/c2*1-4(6)3-5(2)7;/h2*3,6H,1-2H3;/q;;+2/p-2/b2*4-3-;
InChI 密鑰
QYJPSWYYEKYVEJ-FDGPNNRMSA-L
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應用
- Dextromethorphan as a moderator of reward deficiency: Research explored Dextromethorphan′s role in moderating reward deficiency associated with serotonin transporter availability in MDMA-treated animals, indicating its potential application in neuropsychopharmacology and addiction studies (Chiu et al., 2024).
- Pharmacotherapies targeting GABA-Glutamate neurotransmission: A review discussed the use of Dextromethorphan among pharmacotherapies targeting GABA-glutamate neurotransmission for treatment-resistant depression, highlighting its role as an NMDA receptor antagonist and sigma-1 receptor agonist (Vecera et al., 2023).
- Experience-dependent psychological effects: A double-blind study compared the psychological effects of Dextromethorphan and Psilocybin in healthy volunteers, examining their experience-dependent and enduring impacts, relevant in clinical psychology and psychedelic research (Mathai et al., 2023).
訊號詞
Warning
危險聲明
危險分類
Eye Irrit. 2 - Skin Irrit. 2 - STOT SE 3
標靶器官
Respiratory system
儲存類別代碼
11 - Combustible Solids
水污染物質分類（WGK）
WGK 3
閃點（°F）
Not applicable
閃點（°C）
Not applicable
個人防護裝備
dust mask type N95 (US), Eyeshields, Gloves
分析證明 (COA)
輸入產品批次/批號來搜索 分析證明 (COA)。在產品’s標籤上找到批次和批號，寫有 ‘Lot’或‘Batch’.。
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文章
Copper metal deposition processes are an essential tool for depositing interconnects used in microelectronic applications, giving group 11 (coinage metals: Copper, Silver, and Gold) an important place in atomic layer deposition (ALD) process development.
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