推薦產品
化驗
97%
形狀
liquid
折射率
n20/D 1.4415 (lit.)
bp
134-136 °C (lit.)
密度
0.862 g/mL at 25 °C (lit.)
SMILES 字串
C[Si](C)(C)[Si](C)(C)Cl
InChI
1S/C5H15ClSi2/c1-7(2,3)8(4,5)6/h1-5H3
InChI 密鑰
GJCAUTWJWBFMFU-UHFFFAOYSA-N
應用
Chloropentamethyldisilane may be used as one of the constituents for the sythesis of silyloxyjulolidine (SiN1) as a source of silyl radicals which may be used as photoinitiators for free radical photopolymerization. It may also be used in the preparation of 2-pentamethyldisilanyloxymethyl)phenylpentamethyldisilane.
訊號詞
Danger
危險聲明
危險分類
Flam. Liq. 3 - Skin Corr. 1B
安全危害
儲存類別代碼
3 - Flammable liquids
水污染物質分類(WGK)
WGK 3
閃點(°F)
102.2 °F - closed cup
閃點(°C)
39 °C - closed cup
個人防護裝備
Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter
分析證明 (COA)
輸入產品批次/批號來搜索 分析證明 (COA)。在產品’s標籤上找到批次和批號,寫有 ‘Lot’或‘Batch’.。
Silyloxyamines as sources of silyl radicals: ESR spin-trapping, laser flash photolysis investigation, and photopolymerization ability.
Journal of Physical Organic Chemistry, 24(4), 342-350 (2011)
Photoinduced Rearrangement Reaction of 2-(Pentamethyldisilanyloxymethyl) phenylpentamethyldisilane.
Bull. Korean Chem. Soc., 31(3), 731-734 (2010)
Silyloxyamines as sources of silyl radicals: ESR spin-trapping, laser flash photolysis investigation, and photopolymerization ability.
Journal of Physical Organic Chemistry, 24(4), 342-350 (2011)
文章
atomic layer deposition (ALD), microelectronics, Mo:Al2O3 films, nanocomposite coating, photovoltaics, semiconductor devices, W:Al2O3 films, composite films, layer-by-layer
原子層沉積 (ALD)、微電子、Mo:Al2O3 薄膜、奈米複合鍍層、光電、半導體元件、W:Al2O3 薄膜、複合薄膜、逐層鍍膜
Synthesis of Melting Gels Using Mono-Substituted and Di-Substituted Alkoxysiloxanes
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