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GF16472448

Tantalum

foil, 4mm disks, thickness 0.25mm, annealed, 99.9%

Synonym(s):

Tantalum, TA000470, Ta

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About This Item

Empirical Formula (Hill Notation):
Ta
CAS Number:
Molecular Weight:
180.95
MDL number:
UNSPSC Code:
12141741
PubChem Substance ID:
NACRES:
NA.23

vapor pressure

<0.01 mmHg ( 537.2 °C)

Assay

99.90%

form

foil

autoignition temp.

572 °F

manufacturer/tradename

Goodfellow 164-724-48

resistivity

13.5 μΩ-cm, 20°C

diam. × thickness

4 mm × 0.25 mm

bp

5425 °C (lit.)

mp

2996 °C (lit.)

density

16.69 g/cm3 (lit.)

SMILES string

[Ta]

InChI

1S/Ta

InChI key

GUVRBAGPIYLISA-UHFFFAOYSA-N

Related Categories

General description

For updated SDS information please visit www.goodfellow.com.

Legal Information

Product of Goodfellow

Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

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Tantalum foil pegs.
E MAXWELL
American journal of ophthalmology, 34(3), 444-444 (1951-03-01)
Radmila Panajotovic et al.
Radiation research, 165(4), 452-459 (2006-04-04)
We determined effective cross sections for production of single-strand breaks (SSBs) in plasmid DNA [pGEM 3Zf(-)] by electrons of 10 eV and energies between 0.1 and 4.7 eV. After purification and lyophilization on a chemically clean tantalum foil, dry plasmid
T Y Hung et al.
Applied optics, 31(22), 4397-4404 (1992-08-01)
A simple four-element fused-silica lens is presented that has a focal length of 31.2 mm and a relative aperture of f/1 for use as a focusing lens for deep UV laser processing. The curvature of the lens is designed with
J G Sen Gupta
Talanta, 31(12), 1053-1056 (1984-12-01)
A 40-fold increase in sensitivity obtained by using a tantalum foil lining in a pyrolytically-coated graphite furnace permitted determination of low ppm levels of cerium in most silicate rocks. A preliminary preconcentration by oxalate and hydroxide co-precipitations was used before
Zhongli Cai et al.
The journal of physical chemistry. B, 109(10), 4796-4800 (2006-07-21)
Both monolayer and thick (20 microm) films of dry pGEM-3Zf(-) plasmid DNA deposited on tantalum foil were exposed to Al Kalpha X-rays (1.5 keV) for various times in an ultrahigh vacuum chamber. For monolayer DNA, the damage was induced mainly

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