NIST2133

Phosphorus implant in silicon depth profile standard

NIST^® SRM^® 2133

• UNSPSC代码: 41116107
• NACRES: NA.24

属性

• 等级: certified reference material
• 质量水平: 100
• 包装: pkg of each
• 制造商/商品名称: NIST^®
• 应用: semiconductor
• 包装形式: matrix material

说明

一般描述

The SRM contains a single crystal silicon substrate measuring 1 cm × 1 cm, which is ion-implanted with the isotope 31P at a nominal energy of 100 keV.

SRM 2133_cert

SRM 2133_SDS

应用

The SRM is intended to calibrate the secondary ion response for minor and trace concentrations of phosphorus within a silicon matrix using the secondary ion mass spectrometry (SIMS) method.

特点和优势

• Available with certificate documenting NIST-certified retained dose of 31P atoms which is obtained through radiochemical neutron activation analysis (RNAA).
• The NIST certificate is provided with expiration certificate, storage, handling, use, and maintenance instructions.

其他说明

Example analytes are listed below as a reference. Please download a current certificate at nist.gov/SRM for current analytes and certified values.
Phosphorus (³¹P)

法律信息

NIST is a registered trademark of National Institute of Standards and Technology

SRM is a registered trademark of National Institute of Standards and Technology

安全信息

• 储存分类代码: 13 - Non Combustible Solids
• WGK: WGK 3
• 闪点(°F): Not applicable
• 闪点(°C): Not applicable