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Sigma-Aldrich

Tetramethyl orthosilicate

≥99%

Synonym(s):

Tetramethoxysilane

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About This Item

Linear Formula:
Si(OCH3)4
CAS Number:
Molecular Weight:
152.22
Beilstein:
1699658
EC Number:
MDL number:
UNSPSC Code:
12352103
PubChem Substance ID:
NACRES:
NA.23

vapor density

5.25 (vs air)

Quality Level

vapor pressure

13 hPa ( 20 °C)

Assay

≥99%

form

liquid

refractive index

n20/D 1.368 (lit.)

bp

121-122 °C (lit.)

mp

−4 °C (lit.)

density

1.023 g/mL at 25 °C (lit.)

SMILES string

CO[Si](OC)(OC)OC

InChI

1S/C4H12O4Si/c1-5-9(6-2,7-3)8-4/h1-4H3

InChI key

LFQCEHFDDXELDD-UHFFFAOYSA-N

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General description

Tetramethyl orthosilicate is a colorless organosilicon compound consisting of four methoxy groups bonded to a silicon atom. On hydrolysis, it produces silicon dioxide and methanol. It has been widely used in catalysis, synthesis of nanomaterials, ceramics, zeolites, and coating materials.

Application

Tetramethyl orthosilicate can be used:
  • As a precursor to synthesize organic-inorganic coating materials by sol-gel processing method.
  • As an efficient reagent for direct amidation of aliphatic and aromatic carboxylic acids with amines and anilines.
  • As a precursor to fabricate SiO2 nanocomposite films by chemical vapor deposition(CVD) method.
  • As a selective catalyst ofC3-methylation of indole.
Used in the sol-gel synthesis of chromium-doped silicates and in the formation of hexagonal mesoporous silica layers.

Signal Word

Danger

Hazard Statements

Hazard Classifications

Acute Tox. 1 Inhalation - Eye Dam. 1 - Flam. Liq. 3 - Skin Irrit. 2

Storage Class Code

3 - Flammable liquids

WGK

WGK 1

Flash Point(F)

78.8 °F - closed cup

Flash Point(C)

26 °C - closed cup

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

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Fabrication and characteristics of SiOx films by plasma chemical vapor deposition of tetramethylorthosilicate
Mu-Rong Yang, et al.
Surface and Coatings Technology, 123, 204-209 (2000)
Tetramethyl Orthosilicate (TMOS) as a Reagent for Direct Amidation of Carboxylic Acids
D. Christopher Braddock, et al.
Organic Letters, 20, 950-953 (2018)
Tetramethyl orthosilicate as a sharp-selective catalyst of C3-methylation of indole by supercritical methanol
I.V.Kozhevnikov, et al.
Journal of Supercritical Fluids, 69, 82-90 (2012)
Preparation of sol-gel hybrid materials from gamma-methacryloxypropyltrimethoxysilane and tetramethyl orthosilicate: study of the hydrolysis and condensation reactions
Amir A, et al.
Colloid and Polymer Science, 289, 1875-1883 (2011)
Akhilesh Rai et al.
Langmuir : the ACS journal of surfaces and colloids, 26(6), 4152-4159 (2009-12-17)
We report an elegant and simple method to fabricate uniform silica films with controlled thickness, roughness, and hydrophilicity using nanogram quantities of silicatein, a protein involved in silica synthesis in sponges. The formation of uniform silica films was achieved by

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