About This Item
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质量水平
方案
97%
表单
liquid
折射率
n20/D 1.476 (lit.)
密度
0.979 g/mL at 25 °C (lit.)
官能团
amine
SMILES字符串
CN(C)P(=N)(N(C)C)N(C)C
InChI
1S/C6H19N4P/c1-8(2)11(7,9(3)4)10(5)6/h7H,1-6H3
InChI key
GKTNLYAAZKKMTQ-UHFFFAOYSA-N
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Danger
危险声明
危险分类
Eye Dam. 1 - Skin Corr. 1B
储存分类代码
8A - Combustible corrosive hazardous materials
WGK
WGK 3
闪点(°F)
235.4 °F - closed cup
闪点(°C)
113 °C - closed cup
个人防护装备
Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter
其他客户在看
商品
Phosphazene base reagents are available as monomeric (P1 and BEMP), dimeric (P2), and tetrameric (P4) bases with different side chains to control their sterical hindrance.
Phosphazene base reagents are available as monomeric (P1 and BEMP), dimeric (P2), and tetrameric (P4) bases with different side chains to control their sterical hindrance.
Phosphazene base reagents are available as monomeric (P1 and BEMP), dimeric (P2), and tetrameric (P4) bases with different side chains to control their sterical hindrance.
Phosphazene base reagents are available as monomeric (P1 and BEMP), dimeric (P2), and tetrameric (P4) bases with different side chains to control their sterical hindrance.
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