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About This Item
线性分子式:
C6H4[Si(CH3)3]2
CAS号:
分子量:
222.47
Beilstein:
1867055
MDL號碼:
分類程式碼代碼:
12352100
PubChem物質ID:
NACRES:
NA.22
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品質等級
化驗
96%
形狀
solid
bp
194 °C/742 mmHg (lit.)
mp
91-94 °C (lit.)
SMILES 字串
C[Si](C)(C)c1ccc(cc1)[Si](C)(C)C
InChI
1S/C12H22Si2/c1-13(2,3)11-7-9-12(10-8-11)14(4,5)6/h7-10H,1-6H3
InChI 密鑰
NVRBTKMAZQNKPX-UHFFFAOYSA-N
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應用
1,4-双(三甲基硅烷基)苯 (TMSB) 可用于：
- 作为前体通过等离子体辅助化学气相沉积（CVD）工艺开发碳化硅涂层
- 作为定量核磁共振波谱法 (qNMR) 中的二级标准品
- 作为1H NMR波谱法定量测定DMSO-d6溶液中有机小分子的内标物。
儲存類別代碼
11 - Combustible Solids
水污染物質分類（WGK）
WGK 3
閃點（°F）
347.0 °F - closed cup
閃點（°C）
175 °C - closed cup
個人防護裝備
Eyeshields, Gloves, type N95 (US)
其他客户在看
Synthesis of 1, 4-dihydropyrrolo [3, 2-b] pyrrole.
Kumagai T, et al.
Tetrahedron Letters, 25(49), 5669-5672 (1984)
Characterization of small combinatorial chemistry libraries by 1H NMR. Quantitation with a convenient and novel internal standard
Pinciroli V, et al.
Journal of Combinatorial Chemistry, 3(5), 434-440 (2001)
Use and qualification of primary and secondary standards employed in quantitative 1H NMR spectroscopy of pharmaceuticals
Rundlof T, et al.
Journal of Pharmaceutical and Biomedical Analysis, 93(11), 111-117 (2014)
Role of vapor pressure of 1, 4-bis (trimethylsilyl) benzene in developing silicon carbide thin film using a plasma-assisted liquid injection chemical vapor deposition process
Selvakumar J, et al.
Surface and Coatings Technology, 205(11), 3493-3498 (2011)
Torgny Rundlöf et al.
Journal of pharmaceutical and biomedical analysis, 93, 111-117 (2013-11-12)
Standards are required in quantitative NMR (qNMR) to obtain accurate and precise results. In this study acetanilide was established and used as a primary standard. Six other chemicals were selected as secondary standards: 3,4,5-trichloropyridine, dimethylterephthalate, maleic acid, 3-sulfolene, 1,4-bis(trimethylsilyl)benzene, and
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