推荐产品
蒸汽密度
>1 (vs air)
化驗
≥98%
形狀
liquid
折射率
n20/D 1.377 (lit.)
bp
101 °C (lit.)
101 °C
mp
−59 °C (lit.)
密度
0.764 g/mL at 20 °C (lit.)
SMILES 字串
C[Si](C)(C)O[Si](C)(C)C
InChI
1S/C6H18OSi2/c1-8(2,3)7-9(4,5)6/h1-6H3
InChI 密鑰
UQEAIHBTYFGYIE-UHFFFAOYSA-N
正在寻找类似产品? 访问 产品对比指南
一般說明
六甲基二硅氧烷(HMDSO)是一种线性聚二硅氧烷 ,这种有机硅试剂通常被用作通过等离子体增强化学气相沉积(PE-CVD)技术制备硅化合物薄膜的源气体。在硅集成电路技术中,它还用作硅烷的替代品。已采用傅里叶变换质谱对其通过电子轰击产生的离解电离进行了研究。通过大气压辉光(APG)放电合成等离子体聚合的HMDSO薄膜已被报道。在148K的HMDSO晶体是单斜晶体。在P4S10中添加HMDSO可提高其作为硫化剂的效率。
應用
六甲基二硅氧烷可用于:
- 通过干法沉积工艺来制造具有受控疏水性有机硅纳米层的气体扩散层(GDL)。
- 分别使用精氨酸和葡萄糖作为催化剂和还原剂制备涂有二氧化硅的银纳米颗粒。
訊號詞
Danger
危險聲明
防範說明
危險分類
Aquatic Acute 1 - Aquatic Chronic 1 - Flam. Liq. 2
儲存類別代碼
3 - Flammable liquids
水污染物質分類(WGK)
WGK 2
閃點(°F)
21.2 °F - closed cup
閃點(°C)
-6 °C - closed cup
個人防護裝備
Eyeshields, Faceshields, Gloves, type ABEK (EN14387) respirator filter
其他客户在看
ACS applied materials & interfaces, 7(9), 5506-5513 (2015-02-18)
Reliable operation of a proton exchange membrane fuel cell requires proper water management to prevent water flooding in porous carbon materials such as the gas diffusion layer (GDL). In contrast to the conventional GDL that uses the "wet" dip-coating process
Thin films deposition from hexamethyldisiloxane and hexamethyldisilazane under dielectric-barrier discharge (DBD) conditions.
Plasmas and polymers, 5(3-4), 173-190 (2000)
International journal of biological macromolecules, 144, 682-689 (2019-12-21)
In the present study, the effect of plasma treatment on the structural properties of three granular corn starches (normal, Hylon V and Hylon VII) was investigated. Thermal (TGA/DSC), structural (XRD/FTIR) and chemical (XPS) properties were evaluated. Plasma treatment resulted in
Journal of materials chemistry. B, 1(19), 2451-2454 (2013-05-21)
Mesoporous silica-coated silver nanoparticles (Ag@MSN) were prepared by a two step synthesis in an environment friendly way. Arginine and glucose were used as a catalyst for the formation of silica and as a reducing agent for silver ions, respectively, in
The crystal and molecular structures of disiloxane (at 108 K) and hexamethyldisiloxane (at 148 K).
Acta Crystallographica Section B, Structural Science, Crystal Engineering and Materials, 35(9), 2093-2099 (1979)
我们的科学家团队拥有各种研究领域经验,包括生命科学、材料科学、化学合成、色谱、分析及许多其他领域.
联系技术服务部门