Tetrakis(diethylamido)tin(IV) is a volatile compound with four exchangeable ligands. It is widely used as a precursor to produce metal oxide thin films by the chemical vapor deposition method.
Application
Tetrakis(diethylamido)tin(IV) can be used:
As a precursor to synthesize mesoporous tin silicate xerogels via non-hydrolytic templated sol–gel synthesis. These xerogels are potential catalysts for aminolysis and for the Meerwein–Ponndorf–Verley reduction.[1]
To produce stable metal oxide thin films on the surface of carbon electrode materials.[2]
To fabricate an ultrathin layer of SnO2 on carbon nanotubes, which can be used as anodes for lithium-ion batteries. This ultrathin layer helps to enhance the cycling stability and rate capability of anodes.[3]
Growth of ultrathin SnO2 on carbon nanotubes by atomic layer deposition and their application in lithium-ion battery anodes
Shengyun Zhu, et al.
Applied Surface Science, 484, 600-609 (2019)
Electrochemical properties of metal-oxide-coated carbon electrodes prepared by atomic layer deposition
James A Loussaert, et al.
Langmuir, 30, 13707-13715 (2014)
Mesoporous SnO2-SiO2 and Sn-silica-carbon nanocomposites by novel non-hydrolytic templated sol-gel synthesis
David Skoda, et al.
Royal Society of Chemistry Advances, 6, 68739-68747 (2016)
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