901481

Hexamethyldisilazane

10% solution in xylene

• 동의어(들): HMDS
• Linear Formula: C₆H₁₉NSi₂
• CAS Number: 999-97-3
• UNSPSC 코드: 12352103
• NACRES: NA.23

속성

• 형태: liquid
• InChI: 1S/C6H19NSi2/c1-8(2,3)7-9(4,5)6/h7H,1-6H3
• InChI key: FFUAGWLWBBFQJT-UHFFFAOYSA-N

설명

일반 설명

The product is used to augment the adhesion of photoresist on silicon and SiO₂ surfaces.
The effectiveness of HMDS on adhesion is correlated with the reactivity of this compound with surface hydroxyl groups to form a new siloxane end product, i.e. Si-O-Si(CH₃)₃. This newly formed termination on the substrate renders the surface more hydrophobic in character and leads to greater wettability by photoresist. The latter condition is a crucial factor in good bonding. As a result of these altered characteristics due to the surface chemistry, the treated silicon surfaces become highly compatible with both negative and positive photoresists.

애플리케이션

HMDS preparations are generally applied to the silicon wafer while spinning, prior to the application of photoresist. As an alternative procedure, the wafers may be immersed in HMDS preparations and allowed to dry after removal.

특징 및 장점

• Ready-to-use preparations for surface treatment of silicon.
• Promotes photoresist adhesion on silicon and SiO₂ films.
• Prevents lift-off at edges of photoresist and reduces undercutting.
• Ensures full-line resolution.
• Improves yields of MOS and integrated silicon devices.

안전성 정보

• 픽토그램: GHS02,GHS06,GHS08
• 신호어: Danger
• 유해 및 위험 성명서: H226,H304,H311,H315,H319,H332,H335,H373,H412
• 예방조치 성명서: P210 - P273 - P280 - P301 + P310 - P303 + P361 + P353 - P331
• Hazard Classifications: Acute Tox. 3 Dermal - Acute Tox. 4 Inhalation - Aquatic Chronic 3 - Asp. Tox. 1 - Eye Irrit. 2 - Flam. Liq. 3 - Skin Irrit. 2 - STOT RE 2 - STOT SE 3
• 표적 기관: hearing organs, Respiratory system
• Storage Class Code: 3 - Flammable liquids
• WGK: WGK 2
• Flash Point (°F): 77.0 °F
• Flash Point (°C): 25 °C