774030
Zirconium(IV) oxide
sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.95% trace metals basis (excludes 2% HfO2)
동의어(들):
Zirconia
About This Item
분석
99.95% trace metals basis (excludes 2% HfO2)
양식
powder
반응 적합성
core: zirconium
직경 × 두께
2.00 in. × 0.25 in.
bp
5000 °C (lit.)
mp
2700 °C (lit.)
density
5.89 g/mL at 25 °C (lit.)
SMILES string
O=[Zr]=O
InChI
1S/2O.Zr
InChI key
MCMNRKCIXSYSNV-UHFFFAOYSA-N
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애플리케이션
Zirconium oxide sputtering target can be used for physical vapor deposition of zirconia thin films for IT-SOFC, thermal barrier coatings, lead zirconium titanate (PZT) films for sensor applications and other zirconium containing films for different applications.
Storage Class Code
11 - Combustible Solids
WGK
nwg
Flash Point (°F)
Not applicable
Flash Point (°C)
Not applicable
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문서
Nanocomposite Coatings with Tunable Properties Prepared by Atomic Layer Deposition
The properties of many devices are limited by the intrinsic properties of the materials that compose them.
Nanomaterials are considered a route to the innovations required for large-scale implementation of renewable energy technologies in society to make our life sustainable.
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