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Merck
모든 사진(2)

주요 문서

454516

Sigma-Aldrich

Tetrakis(trimethylsilyloxy)silane

97%

동의어(들):

1,1,1,5,5,5-Hexamethyl-3,3-bis[(trimethylsilyl)oxy]trisiloxane, Tetrakis(trimethylsilyl) silicate

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크기 선택

5 ML
₩108,707

₩108,707


예상 입고일2025년 4월 21일세부사항


벌크 견적 요청

크기 선택

보기 변경
5 ML
₩108,707

About This Item

Linear Formula:
[(CH3)3SiO]4Si
CAS Number:
Molecular Weight:
384.84
EC Number:
MDL number:
UNSPSC 코드:
12352103
PubChem Substance ID:
NACRES:
NA.22

₩108,707


예상 입고일2025년 4월 21일세부사항


벌크 견적 요청

Quality Level

분석

97%

refractive index

n20/D 1.389 (lit.)

bp

103-106 °C/2 mmHg (lit.)

density

0.87 g/mL at 25 °C (lit.)

SMILES string

C[Si](C)(C)O[Si](O[Si](C)(C)C)(O[Si](C)(C)C)O[Si](C)(C)C

InChI

1S/C12H36O4Si5/c1-17(2,3)13-21(14-18(4,5)6,15-19(7,8)9)16-20(10,11)12/h1-12H3

InChI key

VNRWTCZXQWOWIG-UHFFFAOYSA-N

애플리케이션

Tetrakis(trimethylsilyloxy)silane (TTMS) is an organosilicon compound used as a precursor to prepare nanostructured organosilicon polymer films by plasma-enhanced chemical vapor deposition (PECVD) at atmospheric pressure.[1] TTMS along with cyclohexane can also be used to synthesize low dielectric constant SiCOH films by PECVD method.[2]

픽토그램

Exclamation mark

신호어

Warning

유해 및 위험 성명서

Hazard Classifications

Eye Irrit. 2 - Skin Irrit. 2 - STOT SE 3

표적 기관

Respiratory system

Storage Class Code

10 - Combustible liquids

WGK

WGK 3

Flash Point (°F)

168.8 °F - closed cup

Flash Point (°C)

76 °C - closed cup

개인 보호 장비

Eyeshields, Gloves, type ABEK (EN14387) respirator filter


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문서 라이브러리 방문

Tetrakis (trimethylsilyloxy) silane for nanostructured SiO2-like films deposited by PECVD at atmospheric pressure
Schafer, J, et al.
Surface and Coatings Technology, 295, 112-118 (2016)
Liqin Zhi et al.
Journal of environmental sciences (China), 76, 199-207 (2018-12-12)
Methylsiloxanes are a class of silicone compounds that have been widely used in various industrial processes and personal care products for several decades. This study investigated the spatial distribution of three cyclic methylsiloxanes (D4-D6) and twelve linear methylsiloxanes (L5-L16) in
Zichun Huang et al.
Water research, 185, 116224-116224 (2020-08-08)
Based on wastewater and raw/digested sludge samples from 29 wastewater treatment plants in 25 Chinese cities, the nationwide profiles of cis- and trans- isomers of phenylmethylsiloxanes (P3 and P4) and trifluoropropylmethylsiloxanes (D3F and D4F) were investigated. Calculated with paired influents/sludges
Junyu Guo et al.
Environment international, 143, 105931-105931 (2020-07-08)
Methylsiloxanes (MSs) are ubiquitous in indoor air and pose an important health risk. Thus, assessments of indoor inhalation exposure by measuring MSs levels in plasma are needed. In this study, we measured plasma MSs concentrations and evaluated daily indoor inhalation
Characteristics of Plasma Polymerized Low-dielectric Constant SiCOH Films Deposited with Tetrakis (trimethylsilyloxy) silane and Cyclohexane Precursors
Kim H, et al.
Bulletin of the Korean Chemical Society,, 35(10), 2941-2944 (2014)

질문

  1. What precursors can be suggested for compatibility with our PECVD system in order to deposit thin films of TiO2?

    1 답변
    1. Typically, a volatile Ti compound such as Titanium(IV) isopropoxide (TTIP), TiCl4, Titanium alkoxides, Ti(acac)4, etc., can be used as the precursor for depositing thin films of TiO2 using a PECVD system. It's important to note that different precursors have different boiling points and may result in different surface structures and morphologies.

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