Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. The extreme miniaturization of components in the semiconductor and electronics industry requires high purity sputtering targets for thin film deposition.
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11 - Combustible Solids
WGK
nwg
Flash Point(F)
Not applicable
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Not applicable
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Zhongguo xiu fu chong jian wai ke za zhi = Zhongguo xiufu chongjian waike zazhi = Chinese journal of reparative and reconstructive surgery, 26(2), 244-247 (2012-03-13)
To review the progress in the treatment of bone defect by porous tantalum implant. Recent literature was extensively reviewed and summarized, concerning the treatment method of bone defect by porous tantalum implant. By right of their unique properties, porous tantalum
American journal of orthopedics (Belle Mead, N.J.), 31(4), 216-217 (2002-05-15)
Conventional materials used for orthopedic reconstruction implants limit the design of new and improved implants. Solid metal is rigid. Porous fixation surfaces have low volumetric porosity available for biologic ingrowth and low frictional characteristics for initial implant stability and have
A detailed literature search was carried out to define the current knowledge about the biological performance of tantalum. The pure metal appears, to a great degree, to be inert both in vivo and in vitro. Both the pure metal and
The properties of many devices are limited by the intrinsic properties of the materials that compose them.
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