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Molar uprighting by a nickel-titanium spring based on a setup model.

American journal of orthodontics and dentofacial orthopedics : official publication of the American Association of Orthodontists, its constituent societies, and the American Board of Orthodontics (2014-07-01)
MoonHee Kim, Minji Kim, Youn-Sic Chun
要旨

Molar uprighting is an important adjunctive treatment in orthodontics: repositioning the tilted molar eliminates the potentially pathologic condition and simplifies the ultimate restorative procedure. Although various methods for molar uprighting have been applied successfully, they still have some limitations and disadvantages in tooth movement. This article reports on a new clinical technique for molar uprighting with nickel-titanium springs based on a setup model. Two patients treated with this system are shown.

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ニッケル, nanopowder, <100 nm avg. part. size, ≥99% trace metals basis
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チタン, foil, thickness 0.127 mm, 99.7% trace metals basis
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チタン, powder, <45 μm avg. part. size, 99.98% trace metals basis
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ニッケル, powder, <50 μm, 99.7% trace metals basis
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ニッケル, powder, <150 μm, 99.99% trace metals basis
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チタン, foil, thickness 0.25 mm, 99.7% trace metals basis
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ニッケル, foil, thickness 0.125 mm, ≥99.9%
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チタン, powder, −100 mesh, 99.7% trace metals basis
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ニッケル, wire, diam. 0.25 mm, ≥99.9%
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ニッケル, powder, <1 μm, 99.8% trace metals basis
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ニッケル, foil, thickness 0.5 mm, 99.98% trace metals basis
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チタン, wire, diam. 0.25 mm, 99.7% trace metals basis
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チタン, sponge, 1-20 mm, 99.5% trace metals basis
チタン, mesh, 100x100mm, nominal aperture 0.19mm, wire diameter 0.23mm, 60x60 wires/inch, open area 20%, twill weave
ニッケル, pellets, 100g, max. size 10mm, 99.999%
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チタン, foil, thickness 0.025 mm, 99.98% trace metals basis
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ニッケル, foil, thickness 0.1 mm, 99.98% trace metals basis
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チタン, foil, thickness 2.0 mm, 99.7% trace metals basis
チタン, mesh, 100x100mm, nominal aperture 4.3mm, wire diameter 1.5mm, 4.4x4.4 wires/inch, open area 94%, platinized diamond mesh
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チタン, foil, thickness 0.5 mm, 99.99% trace metals basis
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ニッケル, foil, thickness 0.25 mm, 99.995% trace metals basis
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チタン, sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.995% trace metals basis
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ニッケル, rod, diam. 6.35 mm, ≥99.99% trace metals basis
ニッケル, foil, 100x100mm, thickness 1.6mm, 99%
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チタン, wire, diam. 1.0 mm, 99.99% trace metals basis
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チタン, foil, thickness 0.25 mm, 99.99% trace metals basis
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チタン, foil, thickness 0.127 mm, ≥99.99% trace metals basis
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チタン, 5-10 mm, ≥99.99% trace metals basis (purity exclusive of Na and K content)
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ニッケル, sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.95% trace metals basis
ニッケル, mesh, 100x250mm, nominal aperture 0.73mm, wire diameter 0.25mm, 26x26 wires/inch, open area 55%, plain weave mesh, 99%