GF32731859
Tantalum
foil, 15mm disks, thickness 0.125mm, annealed, 99.9%
Sinonimo/i:
Tantalum, TA000424, Ta
Autenticatiper visualizzare i prezzi riservati alla tua organizzazione & contrattuali
About This Item
Tensione di vapore
<0.01 mmHg ( 537.2 °C)
Saggio
99.90%
Forma fisica
foil
Temp. autoaccensione
572 °F
Produttore/marchio commerciale
Goodfellow 327-318-59
Resistività
13.5 μΩ-cm, 20°C
diam. × spessore
15 mm × 0.125 mm
P. eboll.
5425 °C (lit.)
Punto di fusione
2996 °C (lit.)
Densità
16.69 g/cm3 (lit.)
Stringa SMILE
[Ta]
InChI
1S/Ta
GUVRBAGPIYLISA-UHFFFAOYSA-N
Descrizione generale
For updated SDS information please visit www.goodfellow.com.
Note legali
Product of Goodfellow
Scegli una delle versioni più recenti:
Certificati d'analisi (COA)
Ci dispiace, ma al momento non ci sono COA disponibili online per questo prodotto.
Se ti serve aiuto, non esitare a contattarci Servizio Clienti
Possiedi già questo prodotto?
I documenti relativi ai prodotti acquistati recentemente sono disponibili nell’Archivio dei documenti.
Radiation research, 165(4), 452-459 (2006-04-04)
We determined effective cross sections for production of single-strand breaks (SSBs) in plasmid DNA [pGEM 3Zf(-)] by electrons of 10 eV and energies between 0.1 and 4.7 eV. After purification and lyophilization on a chemically clean tantalum foil, dry plasmid
Talanta, 31(12), 1053-1056 (1984-12-01)
A 40-fold increase in sensitivity obtained by using a tantalum foil lining in a pyrolytically-coated graphite furnace permitted determination of low ppm levels of cerium in most silicate rocks. A preliminary preconcentration by oxalate and hydroxide co-precipitations was used before
Tantalum foil cuffs in peripheral nerve surgery.
Surgery, 23(3), 507-514 (1948-03-01)
Applied optics, 31(22), 4397-4404 (1992-08-01)
A simple four-element fused-silica lens is presented that has a focal length of 31.2 mm and a relative aperture of f/1 for use as a focusing lens for deep UV laser processing. The curvature of the lens is designed with
The journal of physical chemistry. B, 109(10), 4796-4800 (2006-07-21)
Both monolayer and thick (20 microm) films of dry pGEM-3Zf(-) plasmid DNA deposited on tantalum foil were exposed to Al Kalpha X-rays (1.5 keV) for various times in an ultrahigh vacuum chamber. For monolayer DNA, the damage was induced mainly
Il team dei nostri ricercatori vanta grande esperienza in tutte le aree della ricerca quali Life Science, scienza dei materiali, sintesi chimica, cromatografia, discipline analitiche, ecc..
Contatta l'Assistenza Tecnica.