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Merck

642991

Sigma-Aldrich

Aluminum oxide

nanoparticles, 30-60 nm particle size (TEM), 20 wt. % in H2O

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About This Item

Fórmula lineal:
Al2O3
Número de CAS:
Peso molecular:
101.96
MDL number:
UNSPSC Code:
12352303
eCl@ss:
38120402
PubChem Substance ID:
NACRES:
NA.23

form

dispersion
liquid (suspension)
nanoparticles

Quality Level

concentration

20 wt. % in H2O

particle size

30-60 nm (TEM)

density

1.06 g/mL at 25 °C

SMILES string

O=[Al]O[Al]=O

InChI

1S/2Al.3O

InChI key

TWNQGVIAIRXVLR-UHFFFAOYSA-N

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General description

Aluminium oxide (Al2O3) is a metal oxide based engineered nanosized material that is used in a variety of industrial applications. It can be prepared by the hydrolysis of the alkoxide of Al2O3 and calcinating the particles in the presence of stabilizing agents.

Application

Al2O3 based nanoparticle can be used for a wide range applications such as ceramics, aerospace, wastewater treatment, abrasives, paints, catalysts, and flooring materials.

Other Notes

No dispersant

Storage Class

12 - Non Combustible Liquids

wgk_germany

nwg

flash_point_f

Not applicable

flash_point_c

Not applicable

ppe

Eyeshields, Gloves, multi-purpose combination respirator cartridge (US)


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Artículos

Review the potential of self-assembled multilayer gate dielectric films fabricated from silane precursors for organic, inorganic, and transparent TFT and for TFT circuitry and OLED displays.

Review the potential of self-assembled multilayer gate dielectric films fabricated from silane precursors for organic, inorganic, and transparent TFT and for TFT circuitry and OLED displays.

Review the potential of self-assembled multilayer gate dielectric films fabricated from silane precursors for organic, inorganic, and transparent TFT and for TFT circuitry and OLED displays.

Review the potential of self-assembled multilayer gate dielectric films fabricated from silane precursors for organic, inorganic, and transparent TFT and for TFT circuitry and OLED displays.

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