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Merck
  • Single-step preparation of two-dimensionally organized gold particles via ionic liquid/metal sputter deposition.

Single-step preparation of two-dimensionally organized gold particles via ionic liquid/metal sputter deposition.

Physical chemistry chemical physics : PCCP (2015-04-29)
Daisuke Sugioka, Tatsuya Kameyama, Susumu Kuwabata, Tsukasa Torimoto
摘要

Sputtering of noble metals, such as Au, Ag, Pd, and Pt, onto room-temperature ionic liquids (RTILs) enabled the formation of monoparticle films composed of spherical noble metal nanoparticles on the liquid surface only when the RTILs used contained hydroxyl-functionalized cations as a component. Sputter deposition of these metals under the same conditions simply produced well-dispersed metal particles without the formation of any films on the solution surface when pure RTILs with non-functionalized cations were employed. Anionic species, even those containing a hydroxyl group, did not significantly affect the formation of the particle film on the RTIL surface or dispersion of particles in the solution. The size of Au particles could be controlled by varying the sputtering condition regardless of the two-dimensional particle density, which was determined by the composition of RTILs used. An Au monoparticle film on the RTIL surface was easily transferred onto various solid substrates via the horizontal liftoff method without large aggregation even when the substrate surface was highly curved.

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Sigma-Aldrich
乙腈, anhydrous, 99.8%
Sigma-Aldrich
1-乙基-3-甲基咪唑啉双(三氟甲基磺酰基)亚胺, ≥98% (HPLC)
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1-乙基-3-甲基咪唑乙酸酯, 97%
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1-丁基-3-甲基咪唑四氟硼酸盐, ≥98%
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1-乙基-3-甲基咪唑乙酸酯, ≥95.0% (HPLC)
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1-乙基-3-甲基咪唑硫酸乙酯, ≥95%
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乙腈, HPLC Plus, ≥99.9%, poly-coated bottles
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1-丁基-3-甲基咪唑四氟硼酸盐, ≥97.0% (HPLC)
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1-乙基-3-甲基咪唑四氟硼酸盐, ≥98% (HPLC)
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乙腈 溶液, contains 0.1 % (v/v) trifluoroacetic acid, suitable for HPLC
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乙腈 溶液, contains 0.1 % (v/v) formic acid, suitable for HPLC
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乙腈, electronic grade, 99.999% trace metals basis
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1-丁基-3-甲基咪唑鎓硫氰酸盐, ≥95%
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乙腈, SAJ first grade, ≥99.0%
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乙腈, ≥99.8%, for residue analysis, JIS 1000
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乙腈, for residue analysis, JIS 5000
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