跳转至内容

Degradation of sulphamethazine by means of an improved photo-Fenton process involving a hydrogen peroxide systematic dosage.

Degradation of sulphamethazine by means of an improved photo-Fenton process involving a hydrogen peroxide systematic dosage.

Environmental technology (2014-06-25)

Evelyn Yamal-Turbay, Lydia Pérez González, Moisès Graells, Montserrat Pérez-Moya

摘要

Despite being acknowledged as an emerging contaminant, sulphamethazine (SMT) degradation has received scarce attention in the advanced oxidation processes field. Thus, this work addresses the degradation of SMT in water solutions (12 L of 25mgL-1 samples) by means of a photo-Fenton process and a systematic H202 dosage protocol that enhances its performance. A conventional photo-Fenton process led to 86% mineralization after 120 min treatment when adding the Fenton reactants at once (initial concentrations were 10mgL-1 Fe(II) and 200mgL-1 H2O2). Conversely, the process achieved the total mineralization of the samples in less than 75 min when the same amount of H202 was continuously dosed according to a conveniently tuned dosage protocol. In both cases, total SMT degradation was achieved within 10 min. Hence, this work's aim is to determine the efficient dosage conditions of H2O2. The results show that a significant improvement of the photo-Fenton mineralization of SMT solutions is possible by adjusting the dosage of H2O2.

材料

货号

品牌

产品描述

Sigma-Aldrich

过氧化氢溶液, contains inhibitor, 30 wt. % in H₂O, ACS reagent

Sigma-Aldrich

过氧化氢溶液, 30 % (w/w) in H₂O, contains stabilizer

Sigma-Aldrich

过氧化氢溶液, 50 wt. % in H₂O, stabilized

Sigma-Aldrich

过氧化氢溶液, 30% (w/w), puriss. p.a., reag. ISO, reag. Ph. Eur.

Sigma-Aldrich

铁, ≥99%, reduced, powder (fine)

Sigma-Aldrich

过氧化氢溶液, contains inhibitor, 35 wt. % in H₂O

Sigma-Aldrich

过氧化氢溶液, contains ~200 ppm acetanilide as stabilizer, 3 wt. % in H₂O

Sigma-Aldrich

过氧化氢溶液, purum p.a., ≥35% (RT)

Sigma-Aldrich

羰基铁, ≥97% Fe basis

Sigma-Aldrich

铁, puriss. p.a., carbonyl-Iron powder, low in magnesium and manganese compounds, ≥99.5% (RT)

Sigma-Aldrich

铁, powder, −325 mesh, 97%

Sigma-Aldrich

铁, granular, 10-40 mesh, >99.99% trace metals basis

Sigma-Aldrich

铁, powder, <10 μm, ≥99.9% trace metals basis

Sigma-Aldrich

磺胺二甲基嘧啶, 99.0-101.0% (on dried basis)

Millipore

过氧化氢溶液, 3%, suitable for microbiology

Sigma-Aldrich

过氧化氢溶液, SAJ first grade, ≥30.0%

Sigma-Aldrich

铁, foil, thickness 0.1 mm, ≥99.9% trace metals basis

Sigma-Aldrich

铁, chips, 99.98% trace metals basis

Sigma-Aldrich

铁, wire, diam. 1.0 mm, ≥99.9% trace metals basis

Sigma-Aldrich

过氧化氢溶液, 34.5-36.5%

Sigma-Aldrich

过氧化氢溶液, contains inhibitor, 30 wt. % in H₂O, meets USP testing specifications

Supelco

过氧化氢溶液, ≥30%, for trace analysis

Sigma-Aldrich

铁, nanopowder, 35-45 nm particle size, 99.5% trace metals basis

铁, foil, 100x100mm, thickness 0.25mm, hard, 99.5%

Supelco

过氧化氢溶液, 30 % (w/w), for ultratrace analysis

Sigma-Aldrich

铁, foil, thickness 0.25 mm, ≥99.99% trace metals basis

Sigma-Aldrich

过氧化氢溶液, tested according to Ph. Eur.

铁, foil, 300x300mm, thickness 0.1mm, hard, 99.5%

铁, tube, 200mm, outside diameter 8.0mm, inside diameter 5mm, wall thickness 1.5mm, annealed, 99.5%

Supelco

磺胺二甲基嘧啶, VETRANAL^®, analytical standard