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化驗
99.9% trace metals basis
形狀
fused (granular)
折射率
n20/D 1.544 (lit.)
粒徑
4-20 mesh
mp
1610 °C (lit.)
密度
2.6 g/mL at 25 °C (lit.)
應用
battery manufacturing
SMILES 字串
O=[Si]=O
InChI
1S/O2Si/c1-3-2
InChI 密鑰
VYPSYNLAJGMNEJ-UHFFFAOYSA-N
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應用
SiO2 主要用作具有良好热机械性质的基质材料,可用于多种应用,包括:气相沉积、相沉积、原子力显微镜探头(AFM)、旋转涂覆、电子设备。
儲存類別代碼
13 - Non Combustible Solids
水污染物質分類(WGK)
nwg
閃點(°F)
Not applicable
閃點(°C)
Not applicable
個人防護裝備
dust mask type N95 (US), Eyeshields, Gloves
其他客户在看
The effect of calcination temperature on the surface microstructure and photocatalytic activity of TiO2 thin films prepared by liquid phase deposition.
The Journal of Physical Chemistry B, 107(50), 13871-13879 (2003)
Electrical and optical properties of ZnO transparent conducting films by the sol-gel method.
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Exciton diffusion measurements in poly (3-hexylthiophene).
Advanced Materials, 20(18), 3516-3520 (2008)
Oxygen-aided synthesis of polycrystalline graphene on silicon dioxide substrates.
Journal of the American Chemical Society, 133(44), 17548-17551 (2011)
Measurement of the adhesion force between carbon nanotubes and a silicon dioxide substrate.
Nano Letters, 6(5), 953-957 (2006)
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