GF32441543
Tantalum
foil, 100x100mm, thickness 0.25mm, annealed, 99.99%
Synonym(s):
Tantalum, TA000472, Ta
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About This Item
Recommended Products
vapor pressure
<0.01 mmHg ( 537.2 °C)
Assay
99.99%
form
foil
autoignition temp.
572 °F
manufacturer/tradename
Goodfellow 324-415-43
resistivity
13.5 μΩ-cm, 20°C
L × thickness
100x100 mm × 0.25 mm
bp
5425 °C (lit.)
mp
2996 °C (lit.)
density
16.69 g/cm3 (lit.)
SMILES string
[Ta]
InChI
1S/Ta
InChI key
GUVRBAGPIYLISA-UHFFFAOYSA-N
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General description
For updated SDS information please visit www.goodfellow.com.
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Isolation of the brachial segments of the spinal cord of the chick embryo by means of tantalum foil blocks.
The Journal of experimental zoology, 103(1), 113-142 (1946-10-01)
Nano letters, 10(3), 948-952 (2010-02-12)
Tantalum nitride (Ta3N5) has a band gap of approximately 2.07 eV, suitable for collecting more than 45% of the incident solar spectrum energy. We describe a simple method for scale fabrication of highly oriented Ta3N5 nanotube array films, by anodization
The journal of physical chemistry. B, 109(10), 4796-4800 (2006-07-21)
Both monolayer and thick (20 microm) films of dry pGEM-3Zf(-) plasmid DNA deposited on tantalum foil were exposed to Al Kalpha X-rays (1.5 keV) for various times in an ultrahigh vacuum chamber. For monolayer DNA, the damage was induced mainly
Applied optics, 31(22), 4397-4404 (1992-08-01)
A simple four-element fused-silica lens is presented that has a focal length of 31.2 mm and a relative aperture of f/1 for use as a focusing lens for deep UV laser processing. The curvature of the lens is designed with
Radiation research, 165(4), 452-459 (2006-04-04)
We determined effective cross sections for production of single-strand breaks (SSBs) in plasmid DNA [pGEM 3Zf(-)] by electrons of 10 eV and energies between 0.1 and 4.7 eV. After purification and lyophilization on a chemically clean tantalum foil, dry plasmid
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