GF98666230
Tantalum
foil, light tested, 150x150mm, thickness 0.03mm, as rolled, 99.9%
Sinónimos:
Tantalum, TA000348, Ta
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About This Item
Fórmula empírica (notación de Hill):
Ta
Número de CAS:
Peso molecular:
180.95
Número MDL:
Código UNSPSC:
12141741
ID de la sustancia en PubChem:
NACRES:
NA.23
En este momento no podemos mostrarle ni los precios ni la disponibilidad
presión de vapor
<0.01 mmHg ( 537.2 °C)
Ensayo
≥99.9%
Formulario
foil
temp. de autoignición
572 °F
fabricante / nombre comercial
Goodfellow 986-662-30
resistividad
13.5 μΩ-cm, 20°C
bp
5425 °C (lit.)
mp
2996 °C (lit.)
densidad
16.69 g/cm3 (lit.)
cadena SMILES
[Ta]
InChI
1S/Ta
Clave InChI
GUVRBAGPIYLISA-UHFFFAOYSA-N
Descripción general
For updated SDS information please visit www.goodfellow.com.
Información legal
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Certificados de análisis (COA)
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Encuentre la documentación para los productos que ha comprado recientemente en la Biblioteca de documentos.
J G Sen Gupta
Talanta, 32(1), 1-6 (1985-01-01)
An improved graphite furnace atomic-absorption method has been developed for the determination of Sc, Y and the rare-earth elements in silicate rocks and related materials. The method, which involves the separation of the lanthanides by ion-exchange followed by their determination
Yingxun Du et al.
Journal of hazardous materials, 225-226, 21-27 (2012-05-23)
In order to overcome the limitation of the application of nanoparticles, tantalum (oxy)nitrides nanotube arrays on a Ta foil were synthesized and introduced in vis (visible light)-Fenton-like system to enhance the degradation of atrazine. At first, the anodization of tantalum
J G Sen Gupta
Talanta, 31(12), 1053-1056 (1984-12-01)
A 40-fold increase in sensitivity obtained by using a tantalum foil lining in a pyrolytically-coated graphite furnace permitted determination of low ppm levels of cerium in most silicate rocks. A preliminary preconcentration by oxalate and hydroxide co-precipitations was used before
Zhongli Cai et al.
The journal of physical chemistry. B, 109(10), 4796-4800 (2006-07-21)
Both monolayer and thick (20 microm) films of dry pGEM-3Zf(-) plasmid DNA deposited on tantalum foil were exposed to Al Kalpha X-rays (1.5 keV) for various times in an ultrahigh vacuum chamber. For monolayer DNA, the damage was induced mainly
H H Pieper et al.
The Review of scientific instruments, 83(5), 055110-055110 (2012-06-07)
We present a versatile system for the preparation of oxide crystal surfaces in the ultra-high vacuum (UHV) at temperatures up to 1300 K. Thermal treatment is accomplished by direct current heating of a tantalum foil in contact with the oxide
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