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Merck

651826

Sigma-Aldrich

Chromium etchant

standard

Sinónimos:

Cr etching solution

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About This Item

MDL number:
UNSPSC Code:
12352300
NACRES:
NA.23

grade

standard

Quality Level

composition

volatiles, 85%

color

orange

bp

100 °C/1 atm

density

1.16 g/mL at 25 °C

General description

  • Appearance - Clear orange
  • pH - Acidic
  • Etch Rate at 40 °C - 40 Å/second
  • Etch Capacity (rate declines at ~70%) - 65 g/gallon
  • Shelf Life - 1 year
  • Storage Conditions - Ambient
  • Filtration - 0.2 µm
  • Recommended Operating Temperatures - 20-80 °C (30-40 °C most common)
  • Rinse - Deionized water
  • Photoresist Recommendations - KLT6000 Series, KLT 5300 Series, HARE SQT (SU-8 type), TRANSIST, or PKP -308PI
  • Select Compatible Materials - Au, Ti, oxide, nitride, Si
  • Select Incompatible Materials - Al, Ni, Cu, NiCr
  • Compatible Plastics - HDPE, PP, PTFE, PFA, PVC
  • Isotropy - Isotropic
  • Incompatible Chemicals - Strong bases
Ceric ammonium nitrate-based etchant. Etch rate of 40 Å/sec @ room temp. Etches cleanly with only a deionized water rinse needed.
Chromium etchant is a chromium based solution that removes the excess metal from the substrate. These etchants are majorly used in metal finishing and electronic industry. It has an etch rate of 4 mm/s and can be used to etch nickel, copper, and chromium based excess metals.
Our chromium etchant is high purity ceric ammonium nitrate system for precise, clean etching of chromium and chromium oxide films. Compatible with positive and negative photoresists. Our chromium etchant is filtered to remove all particulates above 0.2 microns. Etching temperature varies depending on film thickness. Etch times range from 15 seconds to 60 seconds at room temperature. Chromium Etchants should be operated in a well-ventilated hood.

Application

The product can etch Al, Cr, Cu, Ni, GaAs. It can surface oxidize Si, Ta/TaN, however, it has no effect on Au, Si3N4, SiO2, Ti, and W surfaces
For use at room temperature or elevated temperature. Etches cleanly, eliminating need for an intermediate rinse. Etching temperature varies with regard to film thickness. Etch times range from 15 to 60 seconds at room temperature. Note, chromium etchants should be handled in a well ventilated hood.

Features and Benefits

Designed for precise, clean etching of chromium and chromium oxide films. Compatible with both positive and negative photoresists. Filtered to 0.2 micron to remove particlulates.

signalword

Danger

Hazard Classifications

Aquatic Chronic 2 - Eye Dam. 1 - Met. Corr. 1 - Ox. Liq. 2 - Skin Corr. 1B - Skin Sens. 1

supp_hazards

Storage Class

5.1B - Oxidizing hazardous materials

wgk_germany

WGK 3

flash_point_f

Not applicable

flash_point_c

Not applicable


Certificados de análisis (COA)

Busque Certificados de análisis (COA) introduciendo el número de lote del producto. Los números de lote se encuentran en la etiqueta del producto después de las palabras «Lot» o «Batch»

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Visite la Librería de documentos

The regeneration and recycle of chromium etching solutions using concentrator cell membrane technology.
Chaudhary AJ, et al.
Chemosphere, 62(5), 841-846 (2006)
Fabrication and Mechanical Properties Measurements of 3D Microtissues for the Study of Cell-Matrix Interactions.
The Surfaceome, 120(5), 303-328 (2018)
Thermoelectric microconverter for energy harvesting systems.
Carmo J, et al.
IEEE Transactions on Industrial Electronics, 57(3), 861-867 (2010)
Pressure-driven Fermi surface reconstruction of chromium
Stillwell RL, et al.
Physical Review, 88(12) (2013)
F J Alfaro-Mozaz et al.
Nature communications, 8, 15624-15624 (2017-06-08)
Polaritons in layered materials-including van der Waals materials-exhibit hyperbolic dispersion and strong field confinement, which makes them highly attractive for applications including optical nanofocusing, sensing and control of spontaneous emission. Here we report a near-field study of polaritonic Fabry-Perot resonances

Protocolos

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

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