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Merck

454516

Sigma-Aldrich

Tetrakis(trimethylsilyloxy)silane

97%

Sinónimos:

1,1,1,5,5,5-Hexamethyl-3,3-bis[(trimethylsilyl)oxy]trisiloxane, Tetrakis(trimethylsilyl) silicate

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About This Item

Fórmula lineal:
[(CH3)3SiO]4Si
Número de CAS:
Peso molecular:
384.84
EC Number:
MDL number:
UNSPSC Code:
12352103
PubChem Substance ID:
NACRES:
NA.22

Quality Level

assay

97%

refractive index

n20/D 1.389 (lit.)

bp

103-106 °C/2 mmHg (lit.)

density

0.87 g/mL at 25 °C (lit.)

SMILES string

C[Si](C)(C)O[Si](O[Si](C)(C)C)(O[Si](C)(C)C)O[Si](C)(C)C

InChI

1S/C12H36O4Si5/c1-17(2,3)13-21(14-18(4,5)6,15-19(7,8)9)16-20(10,11)12/h1-12H3

InChI key

VNRWTCZXQWOWIG-UHFFFAOYSA-N

Application

Tetrakis(trimethylsilyloxy)silane (TTMS) is an organosilicon compound used as a precursor to prepare nanostructured organosilicon polymer films by plasma-enhanced chemical vapor deposition (PECVD) at atmospheric pressure. TTMS along with cyclohexane can also be used to synthesize low dielectric constant SiCOH films by PECVD method.

pictograms

Exclamation mark

signalword

Warning

Hazard Classifications

Eye Irrit. 2 - Skin Irrit. 2 - STOT SE 3

target_organs

Respiratory system

Storage Class

10 - Combustible liquids

wgk_germany

WGK 3

flash_point_f

168.8 °F - closed cup

flash_point_c

76 °C - closed cup

ppe

Eyeshields, Gloves, type ABEK (EN14387) respirator filter


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Tetrakis (trimethylsilyloxy) silane for nanostructured SiO2-like films deposited by PECVD at atmospheric pressure
Schafer, J, et al.
Surface and Coatings Technology, 295, 112-118 (2016)
Characteristics of Plasma Polymerized Low-dielectric Constant SiCOH Films Deposited with Tetrakis (trimethylsilyloxy) silane and Cyclohexane Precursors
Kim H, et al.
Bulletin of the Korean Chemical Society,, 35(10), 2941-2944 (2014)
Zichun Huang et al.
Water research, 185, 116224-116224 (2020-08-08)
Based on wastewater and raw/digested sludge samples from 29 wastewater treatment plants in 25 Chinese cities, the nationwide profiles of cis- and trans- isomers of phenylmethylsiloxanes (P3 and P4) and trifluoropropylmethylsiloxanes (D3F and D4F) were investigated. Calculated with paired influents/sludges
Liqin Zhi et al.
Journal of environmental sciences (China), 76, 199-207 (2018-12-12)
Methylsiloxanes are a class of silicone compounds that have been widely used in various industrial processes and personal care products for several decades. This study investigated the spatial distribution of three cyclic methylsiloxanes (D4-D6) and twelve linear methylsiloxanes (L5-L16) in
Liqin Zhi et al.
Environmental science & technology (2018-10-20)
Fluorinated methylsiloxanes are modified methylsiloxanes and include tris(trifluoropropyl)trimethylcyclotrisiloxane (D3F) and tetrakis(trifluoropropyl)tetramethylcyclotetrasiloxane (D4F). Here, we report fluorinated methylsiloxanes (D3F and D4F) in surface water and sediment samples collected near a fluorinated methylsiloxane manufacturing plant in Weihai, China. The concentrations of D3F

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