257222
Trimethylaluminum
97%
Sinónimos:
TMA
About This Item
Productos recomendados
vapor pressure
69.3 mmHg ( 60 °C)
Quality Level
description
heat of vaporization: ~41.9 kJ/mol (dimer)
assay
97%
form
liquid
reaction suitability
core: aluminum
bp
125-126 °C (lit.)
127 °C/760 mmHg
20 °C/8 mmHg
56 °C/50 mmHg
mp
15 °C (lit.)
density
0.752 g/mL at 25 °C (lit.)
SMILES string
C[Al](C)C
InChI
1S/3CH3.Al/h3*1H3;
Inchi Key
JLTRXTDYQLMHGR-UHFFFAOYSA-N
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General description
Application
- As a growth initiator to synthesize self-assembled aluminum nanoparticles via atomic layer deposition.
- As a precursor to synthesize aluminum-doped ZnO thin films(AZO) for electron transport layer of perovskite solar cells. TMA enhances electrical conductivity and thermal stability of perovskite layers.
- To fabricate Al2O3-coated Si-alloy anodes for Li-ion batteries. This coating helps to suppress the volume expansion of Si and improves cell stability.
- To fabricate Al2O3-coated graphite electrode with superior anti-self-discharging behavior (260 h) with long stability (900 cycles), for Al-ion battery.
Packaging
Compatible with the following:
- Aldrich® Sure/Pac™ station for liquefied gases Z566446
- PTFE Sealing tape Z104388 or Z221880
- Straight septum-inlet adapter Z118141 with septa Z565687 or Z565695
Other Notes
Legal Information
Optional
also commonly purchased with this product
septum inlet adapter
signalword
Danger
hcodes
Hazard Classifications
Eye Dam. 1 - Pyr. Liq. 1 - Skin Corr. 1B - Water-react 1
supp_hazards
Storage Class
4.2 - Pyrophoric and self-heating hazardous materials
wgk_germany
nwg
flash_point_f
No data available
flash_point_c
No data available
ppe
Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter
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Artículos
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Atomic layer deposition (ALD) showcases innovation in novel structure synthesis, area-selective deposition, low-temperature deposition, and more.
Atomic layer deposition (ALD) showcases innovation in novel structure synthesis, area-selective deposition, low-temperature deposition, and more.
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