The technical bulletin for negative photoresist procedures indicates that the developer corresponding to this product is suitable for use with the SU8-2 type of photoresist.
https://www.sigmaaldrich.com/deepweb/assets/sigmaaldrich/product/documents/345/019/al_techbull_al217.pdf
651788
Negative resist developer I
About This Item
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General description
signalword
Danger
Hazard Classifications
Acute Tox. 4 Dermal - Acute Tox. 4 Inhalation - Aquatic Chronic 3 - Asp. Tox. 1 - Eye Irrit. 2 - Flam. Liq. 3 - Repr. 1B - Skin Irrit. 2 - STOT RE 2 Inhalation - STOT SE 3
target_organs
Central nervous system,Liver,Kidney, Respiratory system
Storage Class
3 - Flammable liquids
wgk_germany
WGK 2
flash_point_f
78.8 °F - closed cup
flash_point_c
26 °C - closed cup
ppe
Eyeshields, Faceshields, Gloves, type ABEK (EN14387) respirator filter
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Protocolos
Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.
Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.
Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.
Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.
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Can I use this developer with the photoresist SU8-2?
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