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767514

Sigma-Aldrich

Tantalum

sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.95% trace metals basis

Synonyme(s) :

Ta

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About This Item

Formule empirique (notation de Hill) :
Ta
Numéro CAS:
7440-25-7
Poids moléculaire :
180.95
Numéro CE :
231-135-5
Numéro MDL:
MFCD00011252
Code UNSPSC :
12352103
ID de substance PubChem :
329767321
Nomenclature NACRES :
NA.23

Pression de vapeur

<0.01 mmHg ( 537.2 °C)

Essai

99.95% trace metals basis

Forme

foil

Température d'inflammation spontanée

572 °F

Pertinence de la réaction

core: tantalum

Résistivité

13.5 μΩ-cm, 20°C

Diam. × épaisseur

2.00 in. × 0.25 in.

pb

5425 °C (lit.)

Pf

2996 °C (lit.)

Densité

16.69 g/cm3 (lit.)

Chaîne SMILES 

[Ta]

InChI

1S/Ta

Clé InChI

GUVRBAGPIYLISA-UHFFFAOYSA-N

Application

Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. The extreme miniaturization of components in the semiconductor and electronics industry requires high purity sputtering targets for thin film deposition.

Code de la classe de stockage

11 - Combustible Solids

Classe de danger pour l'eau (WGK)

nwg

Point d'éclair (°F)

Not applicable

Point d'éclair (°C)

Not applicable

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Lot/Batch Number

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Kostantinidis; S.;
The European Physical Journal - Applied Physics, 56(2), 24002/1-24002/1 (2011)
Helmersson; U.;
Thin Solid Films, 513(1-2), 1-1 (2006)
Brett Levine et al.
The journal of knee surgery, 20(3), 185-194 (2007-08-02)
Porous tantalum represents an alternative metal for primary and revision total knee arthroplasty (TKA) with several unique properties. Tantalum is a transition metal, which in its bulk form has shown excellent biocompatibility and is safe to use in vivo as
Jian Lu et al.
Zhongguo xiu fu chong jian wai ke za zhi = Zhongguo xiufu chongjian waike zazhi = Chinese journal of reparative and reconstructive surgery, 26(2), 244-247 (2012-03-13)
To review the progress in the treatment of bone defect by porous tantalum implant. Recent literature was extensively reviewed and summarized, concerning the treatment method of bone defect by porous tantalum implant. By right of their unique properties, porous tantalum
Robert Cohen
American journal of orthopedics (Belle Mead, N.J.), 31(4), 216-217 (2002-05-15)
Conventional materials used for orthopedic reconstruction implants limit the design of new and improved implants. Solid metal is rigid. Porous fixation surfaces have low volumetric porosity available for biologic ingrowth and low frictional characteristics for initial implant stability and have
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