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651796

Sigma-Aldrich

Negative photoresist I

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About This Item

Numéro CAS:
9003-31-0
Numéro MDL:
MFCD00084438
Code UNSPSC :
41116107
Nomenclature NACRES :
NA.23
Le tarif et la disponibilité ne sont pas disponibles actuellement.

Poids mol.

average Mw 60,000-70,000 (polyisoprene)

Niveau de qualité

100

Composition

solids, 27-29 wt. %

Constante diélectrique

2.4

Tension de surface

29.2 dyn/cm

Viscosité

465-535 cP(25 °C)

pb

122-142 °C (lit.)

Densité

0.89 g/mL at 25 °C (lit.)

λmax

310-480 nm

Température de stockage

2-8°C

Chaîne SMILES 

O1C(OCC(C1)(C)C)CCCCCCCC

InChI

1S/C14H28O2/c1-4-5-6-7-8-9-10-13-15-11-14(2,3)12-16-13/h13H,4-12H2,1-3H3

Clé InChI

UBZVSDZJBLSIJG-UHFFFAOYSA-N

Catégories apparentées

Description générale

A stabilized, purified photoresist which exhibits superior resolution, adhesion, etch resistance and low pinhole density.
Available as part of Negative Photoresist kit 654892

Pictogrammes

FlameHealth hazardExclamation mark
GHS02,GHS08,GHS07

Mention d'avertissement

Danger

Classification des risques

Acute Tox. 4 Dermal - Acute Tox. 4 Inhalation - Aquatic Chronic 3 - Asp. Tox. 1 - Eye Irrit. 2 - Flam. Liq. 3 - Repr. 1B - Skin Irrit. 2 - STOT SE 3

Organes cibles

Respiratory system

Code de la classe de stockage

3 - Flammable liquids

Classe de danger pour l'eau (WGK)

WGK 3

Point d'éclair (°F)

75.2 °F - closed cup

Point d'éclair (°C)

24 °C - closed cup

Équipement de protection individuelle

Eyeshields, Faceshields, Gloves, type ABEK (EN14387) respirator filter

Faites votre choix parmi les versions les plus récentes :

Certificats d'analyse (COA)

Lot/Batch Number
MKCK5970
MKCJ2028
MKCG8986
MKCJ0922
MKCF2182

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Si vous avez besoin d'une version particulière, vous pouvez rechercher un certificat spécifique par le numéro de lot.

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Retrouvez la documentation relative aux produits que vous avez récemment achetés dans la Bibliothèque de documents.

Consulter la Bibliothèque de documents

Gérald Guérin et al.
Journal of the American Chemical Society, 130(44), 14763-14771 (2008-10-14)
In alkane solvents, poly(isoprene-b-ferrocenyldimethylsilane) (PI-b-PFS) block copolymer forms fiberlike micelles, which show intriguing similarities with biological fibers such as amyloid fibers. Both systems exhibit fiber growth by a nucleated self-assembly mechanism and rapidly fragment upon exposure to the shear forces
Thomas Schmidt et al.
BMC biochemistry, 11, 11-11 (2010-02-23)
Natural rubber is a biopolymer with exceptional qualities that cannot be completely replaced using synthetic alternatives. Although several key enzymes in the rubber biosynthetic pathway have been isolated, mainly from plants such as Hevea brasiliensis, Ficus spec. and the desert
S Wołoszczuk et al.
The European physical journal. E, Soft matter, 33(4), 343-350 (2010-12-02)
We simulate ABA triblock copolymer melts using a lattice Monte Carlo method, known as cooperative motion algorithm, probing various degrees of compositional asymmetry. Selected order-disorder transition lines are determined in terms of the segment incompatibility, quantified by product χN
Stéphane Dubascoux et al.
Journal of chromatography. A, 1224, 27-34 (2012-01-17)
This paper presents results from the first analyses of the mesostructure of natural rubber (NR) by asymmetrical flow field flow fractionation (AF4). The results are compared with those obtained by size exclusion chromatography (SEC) in terms of average molar masses
Shunsuke Imai et al.
Enzyme and microbial technology, 49(6-7), 526-531 (2011-12-07)
Rubber-degrading bacteria were screened for the production of clearing zones around their colonies on latex overlay agar plates. Novel three bacteria, Streptomyces sp. strain LCIC4, Actinoplanes sp. strain OR16, and Methylibium sp. strain NS21, were isolated. To the best of
Afficher tous les articles scientifiques apparentés

Protocoles

Negative Photoresist Procedure

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

Negative Photoresist Procedure

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

Negative Photoresist Procedure

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

Negative Photoresist Procedure

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

Questions

1–10 of 10 Questions  

  1. How is shipping temperature determined? And how is it related to the product storage temperature?

    1 answer

    1. Products may be shipped at a different temperature than the recommended long-term storage temperature. If the product quality is sensitive to short-term exposure to conditions other than the recommended long-term storage, it will be shipped on wet or dry-ice. If the product quality is NOT affected by short-term exposure to conditions other than the recommended long-term storage, it will be shipped at ambient temperature. As shipping routes are configured for minimum transit times, shipping at ambient temperature helps control shipping costs for our customers. For more information, please refer to the Storage and Transport Conditions document: https://www.sigmaaldrich.com/deepweb/assets/sigmaaldrich/marketing/global/documents/316/622/storage-transport-conditions-mk.pdf

      Helpful?

  2. How can I determine the shelf life / expiration / retest date of this product?

    1 answer

    1. If this product has an expiration or retest date, it will be shown on the Certificate of Analysis (COA, CofA). If there is no retest or expiration date listed on the product's COA, we do not have suitable stability data to determine a shelf life. For these products, the only date on the COA will be the release date; a retest, expiration, or use-by-date will not be displayed.
      For all products, we recommend handling per defined conditions as printed in our product literature and website product descriptions. We recommend that products should be routinely inspected by customers to ensure they perform as expected.
      For products without retest or expiration dates, our standard warranty of 1 year from the date of shipment is applicable.
      For more information, please refer to the Product Dating Information document: https://www.sigmaaldrich.com/deepweb/assets/sigmaaldrich/marketing/global/documents/449/386/product-dating-information-mk.pdf

      Helpful?

  3. Can you provide the estimated resolution for Negative Photoresist I?

    1 answer

    1. According to the supplier, the resolution can achieve 1 micron or even slightly tighter.

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  4. Will UV light physically harden the photo-resist? Also, would it be strippable after UV curing using alcohol or DMSO?

    1 answer

    1. UV light will polymerize/harden the resist. For stripping, it is recommended to use 651761. Alcohol/DMSO are not going to be particularly effective at removal.

      Helpful?

  5. What kind of material is the polymer film after spincoating? Acrylate. Epoxide or other?

    1 answer

    1. The product is a solution of polyisoprene in a mixture of organic solvents. It is not considered an acrylate or an epoxide. Following spin-coating there is a UV cure step that may result in a cross-linked polyisoprene.

      Please see the links below for additional information that may be useful.
      https://www.sigmaaldrich.com/technical-documents/protocol/materials-science-and-engineering/microelectronics-and-nanoelectronics/negative-photoresist
      https://www.sigmaaldrich.com/deepweb/assets/sigmaaldrich/product/documents/345/019/al_techbull_al217.pdf

      For additional questions or concerns please navigate to the link https://www.sigmaaldrich.com/techservice, click on "Product Technical Inquiries" under the Products Section with all the required information so that a member of the Technical Service team can reach out to assist further. Thank you.

      Helpful?

  6. When using Product 651796, Negative photoresist, how do I remove the photoresist film?

    1 answer

    1. Hot chlorinated hydrocarbons such as those in Product No. 651761, Negative Resist Remover I, swell the photoresist, which effectively removes the resist film.  The ideal temperature at which to use the remover is 50-60°C.

      Helpful?

  7. How should Product 651796, Negative photoresist, be stored?

    1 answer

    1. It should be refrigerated to inhibit polymerization and warmed to room temperature before opening.  It should also be stored away from light sources and kept in the sealed bottle.

      Helpful?

  8. At what wavelength does Product 651796, Negative photoresist, have absorbance?

    1 answer

    1. This product has a spectral absorbance range of 310-480nm. The peak spectral sensitivity is around 355nm.

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  9. How do I use Product 651796, Negative photoresist?

    1 answer

    1. Please refer to technical bulletin AL-217 for detailed procedures.

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  10. What is the Department of Transportation shipping information for this product?

    1 answer

    1. Transportation information can be found in Section 14 of the product's (M)SDS.To access the shipping information for this material, use the link on the product detail page for the product.

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