Accéder au contenu
MilliporeSigma
  • Poly(methacrylic acid)-grafted chitosan microspheres via surface-initiated ATRP for enhanced removal of Cd(II) ions from aqueous solution.

Poly(methacrylic acid)-grafted chitosan microspheres via surface-initiated ATRP for enhanced removal of Cd(II) ions from aqueous solution.

Journal of colloid and interface science (2013-06-13)
Liqiang Huang, Shaojun Yuan, Li Lv, Guangqun Tan, Bin Liang, S O Pehkonen
RÉSUMÉ

Cross-linked chitosan (CCS) microspheres tethered with pH-sensitive poly(methacrylic acid) (PMAA) brushes were developed for the efficient removal of Cd(II) ions from aqueous solutions. Functional PMAA brushes containing dense and active carboxyl groups (COOH) were grafted onto the CCS microsphere surface via surface-initiated atom transfer radical polymerization (ATRP). Batch adsorption results showed that solution pH values had a major impact on cadmium adsorption by the PMAA-grafted CCS microspheres with the optimal removal observed above pH 5. The CCS-g-PMAA microsphere was found to achieve the adsorption equilibrium of Cd(II) within 1 h, much faster than about 7 h on the CCS microsphere. At pH 5 and with an initial concentration 0.089-2.49 mmol dm(-3), the maximum adsorption capacity of Cd(II), derived from the Langmuir fitting on the PMAA-grafted microspheres was around 1.3 mmol g(-1). Desorption and adsorption cycle experimental results revealed that the PMAA-grafted CCS microspheres loaded with Cd(II) can be effectively regenerated in a dilute HNO3 solution, and the adsorption capacity remained almost unchanged upon five cycle reuse.

MATÉRIAUX
Référence du produit
Marque
Description du produit

Sigma-Aldrich
Acide nitrique, ACS reagent, 70%
Sigma-Aldrich
Acide nitrique, 70%, purified by redistillation, ≥99.999% trace metals basis
Sigma-Aldrich
Acide nitrique, puriss. p.a., reag. ISO, reag. Ph. Eur., for determinations with dithizone, ≥65%
Sigma-Aldrich
Acide nitrique, puriss. p.a., 65.0-67.0%
Sigma-Aldrich
Acide nitrique, puriss. p.a., ≥65% (T)
Sigma-Aldrich
Acide nitrique, red, fuming, HNO3 >90 %
Sigma-Aldrich
Poly(methacrylic acid, sodium salt) solution, average Mn ~5,400, average Mw ~9,500 by GPC, 30 wt. % in H2O
Supelco
Acide nitrique solution, 0.1 M HNO3 in water (0.1N), eluent concentrate for IC
Sigma-Aldrich
Acide nitrique, ACS reagent, ≥90.0%
Sigma-Aldrich
Poly(methacrylic acid, sodium salt) solution, average Mw 4,000-6,000, 40 wt. % in H2O