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Merck
  • Influence of surface treatment on the performance of silorane-based composite resin in class I restorations: a randomized clinical trial.

Influence of surface treatment on the performance of silorane-based composite resin in class I restorations: a randomized clinical trial.

Clinical oral investigations (2018-02-18)
Isabella Pereira Marques, Fabíola Belkiss Santos de Oliveira, João Gabriel Silva Souza, Raquel Conceição Ferreira, Claudia Silami Magalhães, Fabiana Mantovani Gomes França, Daniela Araújo Veloso Popoff
RESUMO

The aim of this study was to evaluate the clinical performance of silorane-based composite restorations applied after different surface treatments. This controlled and randomized clinical trial included 26 patients with class I restoration indications. The teeth were randomly assigned to the following treatments: control 1/G1, silorane specific self-etching adhesive (P90 self-etch primer and bond) + silorane-based composite resin (Filtek™ P90 low shrink posterior restorative); G2, 37% phosphoric acid + silorane specific self-etching adhesive + silorane-based composite resin; G3, blasting with aluminum oxide + silorane specific self-etching adhesive + silorane-based composite resin; and control 2/G4, self-etching adhesive (Adper™ SE Plus self-etch adhesive) + dimethacrylate-based composite resin (Filtek™ P60 posterior restorative). The clinical performance was evaluated at baseline and after 1 year. A total of 141 restorations were made and evaluated. For all clinical criteria evaluated, no significant difference was found between the surface treatments at baseline and after 1 year (p > 0.05). After 1 year, only the group with 37% phosphoric acid + silorane specific self-etching adhesive (G2) showed a significant reduction in marginal adaptation (p < 0.05). In general, all surface treatments showed an adequate clinical performance for silorane-based composite resin in class I restorations. However, a reduction in the marginal adaptation after 1 year was found when additional phosphoric acid etching was used prior to silorane specific self-etching adhesive. The use of phosphoric acid etching prior to specific self-etching adhesive can adversely affect the marginal adaptation of silorane-based restorations.