Accéder au contenu

A facile two-step dipping process based on two silica systems for a superhydrophobic surface.

A facile two-step dipping process based on two silica systems for a superhydrophobic surface.

Chemical communications (Cambridge, England) (2011-08-30)

Xiaoguang Li, Jun Shen

RÉSUMÉ

A silica microsphere suspension and a silica sol are employed in a two-step dipping process for the preparation of a superhydrophobic surface. It's not only a facile way to achieve the lotus effect, but can also create a multi-functional surface with different wetabilities, adhesive forces and transparencies.

MATÉRIAUX

Référence du produit

Marque

Description du produit

Sigma-Aldrich

Lithium bis(triméthylsilyl)amide solution, 1.0 M in THF

Sigma-Aldrich

Hexaméthyldisilazane, reagent grade, ≥99%

Sigma-Aldrich

Sodium bis(trimethylsilyl)amide solution, 1.0 M in THF

Sigma-Aldrich

Potassium bis(triméthylsilyl)amide solution, 1 M in THF

Sigma-Aldrich

Potassium bis(trimethylsilyl)amide, 95%

Sigma-Aldrich

Hexaméthyldisilazane, ReagentPlus^®, 99.9%

Sigma-Aldrich

Lithium bis(trimethylsilyl)amide, 97%

Sigma-Aldrich

Lithium bis(triméthylsilyl)amide solution, 1 M in toluene

Sigma-Aldrich

Sodium bis(trimethylsilyl)amide, 95%

Sigma-Aldrich

Lithium bis(triméthylsilyl)amide solution, 1.5 M in THF

Sigma-Aldrich

Potassium bis(triméthylsilyl)amide solution, 0.5 M in toluene

Sigma-Aldrich

Lithium bis(triméthylsilyl)amide solution, 1.0 M in hexanes

Sigma-Aldrich

Sodium bis(trimethylsilyl)amide solution, 40% in THF

Supelco

Hexaméthyldisilazane, for GC derivatization, LiChropur^™, ≥99.0% (GC)

Sigma-Aldrich

Hexaméthyldisilazane, produced by Wacker Chemie AG, Burghausen, Germany, ≥97.0% (GC)

Sigma-Aldrich

Sodium bis(trimethylsilyl)amide solution, 0.6 M in toluene

Sigma-Aldrich

Potassium bis(triméthylsilyl)amide solution, 1.0 M in 2-methyltetrahydrofuran

Sigma-Aldrich

Lithium bis(triméthylsilyl)amide solution, 1 M in tert-butyl methyl ether

Sigma-Aldrich

Lithium bis(triméthylsilyl)amide solution, 0.5 M in 2-methyltetrahydrofuran

Sigma-Aldrich

Tris[N,N-bis(trimethylsilyl)amide]samarium(III), 98%