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651788

Sigma-Aldrich

Negative resist developer I

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250 ML
$36.02

$36.02

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Available to ship onApril 01, 2025Details


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250 ML
$36.02

About This Item

UNSPSC Code:
12352300
NACRES:
NA.23

$36.02

List Price$45.60Save 21%

Available to ship onApril 01, 2025Details


Request a Bulk Order

bp

129-138 °C (lit.)

density

0.89 g/mL at 25 °C (lit.)

storage temp.

2-8°C

General description

Available as part of Negative Photoresist kit 654892

signalword

Danger

Hazard Classifications

Acute Tox. 4 Dermal - Acute Tox. 4 Inhalation - Aquatic Chronic 3 - Asp. Tox. 1 - Eye Irrit. 2 - Flam. Liq. 3 - Repr. 1B - Skin Irrit. 2 - STOT RE 2 Inhalation - STOT SE 3

target_organs

Central nervous system,Liver,Kidney, Respiratory system

Storage Class

3 - Flammable liquids

wgk_germany

WGK 2

flash_point_f

78.8 °F - closed cup

flash_point_c

26 °C - closed cup

ppe

Eyeshields, Faceshields, Gloves, type ABEK (EN14387) respirator filter


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Protocols

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

Questions

  1. Can I use this developer with the photoresist SU8-2?

    1 answer
    1. The technical bulletin for negative photoresist procedures indicates that the developer corresponding to this product is suitable for use with the SU8-2 type of photoresist.
      https://www.sigmaaldrich.com/deepweb/assets/sigmaaldrich/product/documents/345/019/al_techbull_al217.pdf

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