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333859

Tetraethyl orthosilicate

99.999% trace metals basis

Synonym(s):

Orthosilicic acid tetraethyl ester, Silicon tetraethoxide, TEOS, Tetraethoxysilane, Tetraethoxysilicon(IV), Tetraethyl silicate

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About This Item

Linear Formula:
Si(OC2H5)4
CAS Number:
78-10-4
Molecular Weight:
208.33
UNSPSC Code:
12352103
NACRES:
NA.23
PubChem Substance ID:
24860192
EC Number:
201-083-8
Beilstein/REAXYS Number:
1422225
MDL number:
MFCD00009062
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vapor density

7.2 (vs air)

Quality Level

200

vapor pressure

<1 mmHg ( 20 °C)

assay

99.999% trace metals basis

form

liquid

refractive index

n20/D 1.382 (lit.)

bp

168 °C (lit.)

density

0.933 g/mL at 20 °C (lit.)

SMILES string

CCO[Si](OCC)(OCC)OCC

InChI

1S/C8H20O4Si/c1-5-9-13(10-6-2,11-7-3)12-8-4/h5-8H2,1-4H3

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This Item
75941409-246086578
Tetraethyl orthosilicate 99.999% trace metals basis

Sigma-Aldrich

333859

Tetraethyl orthosilicate

Tetraethyl orthosilicate packaged for use in deposition systems

Sigma-Aldrich

759414

Tetraethyl orthosilicate

Tetraethyl orthosilicate SAJ first grade, &#8805;95.0%

Sigma-Aldrich

09-2460

Tetraethyl orthosilicate

Tetraethyl orthosilicate &#8805;99.0% (GC)

Sigma-Aldrich

86578

Tetraethyl orthosilicate

assay

99.999% trace metals basis

assay

≥99.5% (GC)

assay

≥95.0%

assay

≥99.0% (GC)

form

liquid

form

liquid

form

liquid

form

liquid

density

0.933 g/mL at 20 °C (lit.)

density

0.933 g/mL at 20 °C (lit.)

density

0.933 g/mL at 20 °C (lit.)

density

0.933 g/mL at 20 °C (lit.)

vapor pressure

<1 mmHg ( 20 °C)

vapor pressure

<1 mmHg ( 20 °C)

vapor pressure

<1 mmHg ( 20 °C)

vapor pressure

<1 mmHg ( 20 °C)

vapor density

7.2 (vs air)

vapor density

7.2 (vs air)

vapor density

7.2 (vs air)

vapor density

7.2 (vs air)

refractive index

n20/D 1.382 (lit.)

refractive index

n20/D 1.382 (lit.)

refractive index

n20/D 1.382 (lit.)

refractive index

n20/D 1.382 (lit.), n20/D 1.383

General description

Tetraethyl orthosilicate (TEOS) is an inorganic material used as a precursor for the synthesis of silica-based materials by methods such as sol gel technique, due to its high affinity to water. It can also be used in the synthesis of blended membranes.

Application

Commonly used as a precursor to prepare xerogel
Will interact with dodecylamine in the formation of intercalation compounds of H+-magadiite and used in a study of mixed-metal bioactive glasses.
TEOS is majorly used as a silicon source in the synthesis of silicon oxide which can be further used in a variety of optoelectronics based applications. It can also be used in the formation of hybrid coatings for potential usage in corrosion protection.

pictograms

FlameExclamation mark
GHS02,GHS07

signalword

Warning

Hazard Classifications

Acute Tox. 4 Inhalation - Eye Irrit. 2 - Flam. Liq. 3 - STOT SE 3

target_organs

Respiratory system

Storage Class

3 - Flammable liquids

wgk

WGK 1

flash_point_f

113.0 °F - closed cup

flash_point_c

45 °C - closed cup

ppe

Eyeshields, Faceshields, Gloves, type ABEK (EN14387) respirator filter

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Certificates of Analysis (COA)

Lot/Batch Number
MKCP3465
MKCJ6565
SHBK9149
MKCD9057
MKBZ8687V

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Development of hermetic barrier using vinyl triethoxysilane (VTEOS) and sol-gel processing
Jackson A, et al.
Material Matters, 1, 11-12 (2006)
Sol-Gel Science for Ceramic Materials
Young SK, et al.
Material Matters (2006)
Sol-gel-derived hybrid coatings for corrosion protection
Chou TP, et al.
Journal of Sol-Gel Science and Technology, 26(1-3), 321-327 (2003)
Deposition of thick TEOS PECVD silicon oxide layers for integrated optical waveguide applications
Bulla DAP and Morimoto NI
Thin Solid Films, 334, 60-64 (1998)
A performance evaluation of direct methanol fuel cell using impregnated tetraethyl-orthosilicate in cross-linked polymer membrane
Jung DH, et al.
International Journal of Hydrogen Energy, 26(12), 1263-1269 (2001)
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Global Trade Item Number

SKUGTIN
333859-100ML04061838253385
333859-25ML04061826737583

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