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09649

Sigma-Aldrich

5-Benzoyl-4-hydroxy-2-methoxybenzenesulfonic acid

≥97.0% (HPLC)

Synonym(s):

HMBS, Sulisobenzone

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About This Item

Empirical Formula (Hill Notation):
C14H12O6S
CAS Number:
4065-45-6
Molecular Weight:
308.31
Beilstein/REAXYS Number:
2889165
EC Number:
223-772-2
MDL number:
MFCD00024962
UNSPSC Code:
12352100
PubChem Substance ID:
329748781
NACRES:
NA.22

assay

≥97.0% (HPLC)

form

powder

impurities

≤10% water

SMILES string

COc1cc(O)c(cc1S(O)(=O)=O)C(=O)c2ccccc2

InChI

1S/C14H12O6S/c1-20-12-8-11(15)10(7-13(12)21(17,18)19)14(16)9-5-3-2-4-6-9/h2-8,15H,1H3,(H,17,18,19)

InChI key

CXVGEDCSTKKODG-UHFFFAOYSA-N

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GHS07

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Warning

Hazard Classifications

Aquatic Chronic 3 - Eye Irrit. 2 - Skin Irrit. 2

Storage Class

11 - Combustible Solids

wgk_germany

WGK 1

flash_point_f

No data available

flash_point_c

No data available

ppe

dust mask type N95 (US), Eyeshields, Gloves

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Certificates of Analysis (COA)

Lot/Batch Number
0000237737
0000208715
0000199111
0000207070

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N Negreira et al.
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The stability of the UV filter benzophenone-4 (BP-4) in free chlorine-containing water was investigated, for the first time, by liquid chromatography quadrupole time-of-flight mass spectrometry (LC-QqTOF-MS). High mass accuracy and resolution capabilities of this hybrid mass spectrometer were used for
B K Shoichet et al.
Science (New York, N.Y.), 259(5100), 1445-1450 (1993-03-05)
A molecular docking computer program (DOCK) was used to screen the Fine Chemical Directory, a database of commercially available compounds, for molecules that are complementary to thymidylate synthase (TS), a chemotherapeutic target. Besides retrieving the substrate and several known inhibitors
T Merion Hughes et al.
Contact dermatitis, 56(3), 153-156 (2007-02-14)
Chemical ultraviolet (UV) filters have, over the last few decades, been increasingly used not only in conventional sunscreen products but also in many cosmetics and toiletries. Allergic contact dermatitis as well as photoallergic contact dermatitis reactions have been well documented
Caroline Dayan et al.
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Exposure to ethylene glycol monomethyl ether (EGME), a glycol ether compound found in numerous industrial products, or to its active metabolite, 2-methoxyacetic acid (2-MAA), increases the incidence of developmental defects. Using an in vitro limb bud culture system, we tested
D Chrétien et al.
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