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335355

Sigma-Aldrich

Coronene

purified by sublimation, 99%

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About This Item

Empirical Formula (Hill Notation):
C24H12
CAS Number:
191-07-1
Molecular Weight:
300.35
Beilstein/REAXYS Number:
658468
EC Number:
205-881-7
MDL number:
MFCD00004134
UNSPSC Code:
12352103
PubChem Substance ID:
24860308
NACRES:
NA.23

Quality Level

100

assay

99%

purified by

sublimation

bp

525 °C (lit.)

mp

428 °C (lit.)

SMILES string

c1cc2ccc3ccc4ccc5ccc6ccc1c7c2c3c4c5c67

InChI

1S/C24H12/c1-2-14-5-6-16-9-11-18-12-10-17-8-7-15-4-3-13(1)19-20(14)22(16)24(18)23(17)21(15)19/h1-12H

InChI key

VPUGDVKSAQVFFS-UHFFFAOYSA-N

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Related Categories

Application

An n-channel organic semiconductor.
Used to synthesize MBE-grown layered superconductors.

Storage Class

11 - Combustible Solids

wgk_germany

WGK 3

flash_point_f

Not applicable

flash_point_c

Not applicable

ppe

Eyeshields, Gloves, type N95 (US)

Certificates of Analysis (COA)

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Jpn J. App. Phys., Part I, 34, 3837-3845 (1995)
Leo Gross et al.
Science (New York, N.Y.), 337(6100), 1326-1329 (2012-09-18)
We show that the different bond orders of individual carbon-carbon bonds in polycyclic aromatic hydrocarbons and fullerenes can be distinguished by noncontact atomic force microscopy (AFM) with a carbon monoxide (CO)-functionalized tip. We found two different contrast mechanisms, which were
A versatile Fréchet-dendron compound unifies host-guest and templated heterogeneous self-assembly.
Kathrin Gruber et al.
Advanced materials (Deerfield Beach, Fla.), 23(19), 2195-2198 (2011-04-07)
Long Chen et al.
Journal of the American Chemical Society, 134(43), 17869-17872 (2012-10-16)
Here we report hexathienocoronenes (HTCs), fully thiophene-annelated coronenes in which six double bonds in the periphery are thieno-fused. The derivatives tetrasubstituted with hexyl and dodecyl chains show a phase formation that strongly depends on the chain length. HTCs are remarkably
Anna M Hiszpanski et al.
ACS nano, 7(1), 294-300 (2012-12-12)
The structuring in organic electrically active thin films critically influences the performance of devices comprising them. Controlling film structure, however, remains challenging and generally requires stringent deposition conditions or modification of the substrate. To this end, we have developed post-deposition
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