Skip to Content
MilliporeSigma
All Photos(1)

Documents

317004

Sigma-Aldrich

Tantalum(V) fluoride

98%

Synonym(s):

Tantalum pentafluoride

Sign Into View Organizational & Contract Pricing


About This Item

Linear Formula:
TaF5
CAS Number:
Molecular Weight:
275.94
EC Number:
MDL number:
UNSPSC Code:
12352302
PubChem Substance ID:
NACRES:
NA.23

assay

98%

form

powder

reaction suitability

reagent type: catalyst
core: tantalum

density

4.74 g/mL at 25 °C (lit.)

SMILES string

F[Ta](F)(F)(F)F

InChI

1S/5FH.Ta/h5*1H;/q;;;;;+5/p-5

InChI key

YRGLXIVYESZPLQ-UHFFFAOYSA-I

General description

Tantalum(V) fluoride is a volatile inorganiccompound widely used as a precursor for atomic layer deposition, to producemetal fluoride thin films and as a catalyst in various organic transformations.

Application

Tantalum(V) fluoride can be used:
  • As a precursor for atomic layer deposition of thin films on the cathode materials of Li-ion batteries.
  • As a dopant to enhance the photochemical activity of hematite by improving charge carrier mobility and reducing recombination of photogenerated holes and electrons.
  • To enhance the photocurrent stability and photoluminescence of WO3 films (used as photoelectrode for photolysis of water).
  • As a catalyst for N-alkylation of arylamines with benzylalcohols.

pictograms

Corrosion

signalword

Danger

hcodes

Hazard Classifications

Eye Dam. 1 - Skin Corr. 1B

Storage Class

8B - Non-combustible corrosive hazardous materials

wgk_germany

WGK 3

flash_point_f

Not applicable

flash_point_c

Not applicable

ppe

Eyeshields, Faceshields, Gloves, type P3 (EN 143) respirator cartridges


Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

Already Own This Product?

Find documentation for the products that you have recently purchased in the Document Library.

Visit the Document Library

Improvement of Hematite as Photocatalyst by Doping with Tantalum
Xinsheng Zhang, et al.
The Journal of Physical Chemistry C, 118, 16842-16850 (2014)
Influence of tantalum dopant ions (Ta5+) on the efficiency of the tungsten trioxide photoelectrode
A Enesca, et al.
Physica Status Solidi (A): Applied Research, 205, 2038-2041 (2008)
Applications and Advantages of Atomic Layer Deposition for Lithium-Ion Batteries Cathodes
Yury Koshtyal, et al.},
Lithium-Ion Batteries, 8, 184-184 (2022)

Our team of scientists has experience in all areas of research including Life Science, Material Science, Chemical Synthesis, Chromatography, Analytical and many others.

Contact Technical Service