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Sigma-Aldrich

Hafnium

powder, −325 mesh, 99.5% trace metals basis (purity excludes ~2% zirconium), contains 1:10 pentanol to water solution as stabilizer

Synonym(s):

Celtium, Hafnium element

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About This Item

Empirical Formula (Hill Notation):
Hf
CAS Number:
7440-58-6
Molecular Weight:
178.49
EC Number:
231-166-4
MDL number:
MFCD00011032
UNSPSC Code:
12352300
PubChem Substance ID:
24856157
NACRES:
NA.23

assay

99.5% trace metals basis (purity excludes ~2% zirconium)

form

powder

contains

1:10 pentanol to water solution as stabilizer

resistivity

29.6 μΩ-cm, 0°C

particle size

−325 mesh

bp

4602 °C (lit.)

mp

2227 °C (lit.)

density

13.3 g/cm3 (lit.)

SMILES string

[Hf]

InChI

1S/Hf

InChI key

VBJZVLUMGGDVMO-UHFFFAOYSA-N

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pictograms

Flame
GHS02

signalword

Danger

hcodes

H228,H250

Hazard Classifications

Flam. Sol. 1 - Pyr. Sol. 1

Storage Class

4.2 - Pyrophoric and self-heating hazardous materials

wgk_germany

WGK 3

flash_point_f

Not applicable

flash_point_c

Not applicable

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Certificates of Analysis (COA)

Lot/Batch Number
MKCK9646
MKBX3998V
MKBV7523V
MKBR9046V
MKBQ2316V

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Yu Gong et al.
Dalton transactions (Cambridge, England : 2003), 41(38), 11706-11715 (2012-08-18)
The isolated group 4 metal oxydifluoride molecules OMF(2) (M = Ti, Zr, Hf) with terminal oxo groups are produced specifically on the spontaneous reactions of metal atoms with OF(2) through annealing in solid argon. The product structures and vibrational spectra
Christopher C Underwood et al.
Inorganic chemistry, 52(1), 237-244 (2012-12-19)
This paper describes the hydrothermal chemistry of alkali hafnium fluorides, including the synthesis and structural characterization of five new alkali hafnium fluorides. Two ternary alkali hafnium fluorides are described: Li(2)HfF(6) in space group P31m with a = 4.9748(7) Å and
Zhichao Liu et al.
Optics express, 20(2), 854-863 (2012-01-26)
Damage tests are carried out at 1064nm to measure the laser resistance of TiO(2)/Al(2)O(3) and HfO(2)/Al(2)O(3) antireflection coatings grown by atomic layer deposition (ALD). The damage results are determined by S-on-1 and R-on-1 tests. Interestingly, the damage performance of ALD
Tingting Zhao et al.
Journal of biomedical materials research. Part B, Applied biomaterials, 100(3), 646-659 (2011-11-29)
Hafnium ion implantation was applied to NiTi alloy to suppress Ni ion release and enhance osteoblast-material interactions and hemocompatibility. The auger electron spectroscopy, x-ray photoelectron spectroscopy, and atomic force microscope results showed that a composite TiO(2)/HfO(2) nanofilm with increased surface
José Luis Olivares-Romero et al.
Journal of the American Chemical Society, 134(12), 5440-5443 (2012-03-17)
Asymmetric epoxidation of allylic and homoallylic amine derivatives catalyzed by Hf(IV)-bishydroxamic acid complexes is described. Under similar conditions, aldimine and ketimine produced oxaziridines. The sulfonyl group is demonstrated to be an effective directing group for these transformations.
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