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651842

Sigma-Aldrich

Gold etchant, nickel compatible

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About This Item

MDL number:
UNSPSC Code:
12352300
NACRES:
NA.23

vapor density

9 (vs air)

vapor pressure

0.3 mmHg ( 15 °C)

composition

volatiles, 50-80%

bp

100 °C/1 atm

solubility

H2O: miscible at 20 °C

General description

Nickel compatible gold etchant is an etching solution that can be used in the removal of the gold layer from the surface. Compatibility of gold etchants with nickel allows it to be utilized in applications where nickel is used as a dominant material in the fabrication of micro-electro-mechanical systems (MEMS).

Application

Elective general-purpose etchant for gold. Compatible with negative and positive photoresists.

Features and Benefits

Etching readily controlled with minimum undercutting. Room temperature operated. Cyanide-free, no attack of nickel films.

Pictograms

Health hazard

Signal Word

Danger

Hazard Statements

Precautionary Statements

Hazard Classifications

STOT RE 1 Oral

Target Organs

Thyroid

Storage Class Code

6.1D - Non-combustible acute toxic Cat.3 / toxic hazardous materials or hazardous materials causing chronic effects

WGK

WGK 3

Flash Point(F)

Not applicable

Flash Point(C)

Not applicable

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

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Protocols

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

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