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About This Item
Linear Formula:
(CH3)3SiOSi(CH3)3
CAS Number:
Molecular Weight:
162.38
Beilstein:
1736258
EC Number:
MDL number:
UNSPSC Code:
12352103
PubChem Substance ID:
NACRES:
NA.22
Recommended Products
vapor density
>1 (vs air)
Quality Level
Assay
≥98%
form
liquid
refractive index
n20/D 1.377 (lit.)
bp
101 °C (lit.)
101 °C
mp
−59 °C (lit.)
density
0.764 g/mL at 20 °C (lit.)
SMILES string
C[Si](C)(C)O[Si](C)(C)C
InChI
1S/C6H18OSi2/c1-8(2,3)7-9(4,5)6/h1-6H3
InChI key
UQEAIHBTYFGYIE-UHFFFAOYSA-N
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General description
Hexamethyldisiloxane (HMDSO), a linear polydisiloxane, is an organosilicon reagent commonly utilized as a source for plasma enhanced chemical vapor deposition (PE-CVD) of thin films of silicon compounds. It is also employed as a substitute to silane in silicon integrated circuit technology. Its dissociative ionization by electron impact has been studied by Fourier transform mass spectrometry. Synthesis of plasma-polymerized HMDSO thin films by atmospheric pressure glow (APG) discharge has been reported. Crystals of HMDSO at 148K are monoclinic. Addition of HMDSO to P4S10, improves its efficiency as thionating agent.
Application
Hexamethyldisiloxane can be used:
- To fabricate a gas diffusion layer (GDL) with controlled hydrophobic silicone nano-layer by the dry deposition process.
- To prepare silver nanoparticles coated with silica using arginine and glucose as the catalyst and the reducing agent, respectively.
Signal Word
Danger
Hazard Statements
Precautionary Statements
Hazard Classifications
Aquatic Acute 1 - Aquatic Chronic 1 - Flam. Liq. 2
Storage Class Code
3 - Flammable liquids
WGK
WGK 2
Flash Point(F)
21.2 °F - closed cup
Flash Point(C)
-6 °C - closed cup
Personal Protective Equipment
dust mask type N95 (US), Eyeshields, Gloves
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Synthesis of plasma-polymerized tetraethoxysilane and hexamethyldisiloxane films prepared by atmospheric pressure glow discharge.
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The crystal and molecular structures of disiloxane (at 108 K) and hexamethyldisiloxane (at 148 K).
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Acta Crystallographica Section B, Structural Science, Crystal Engineering and Materials, 35(9), 2093-2099 (1979)
Thin films deposition from hexamethyldisiloxane and hexamethyldisilazane under dielectric-barrier discharge (DBD) conditions.
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Reliable operation of a proton exchange membrane fuel cell requires proper water management to prevent water flooding in porous carbon materials such as the gas diffusion layer (GDL). In contrast to the conventional GDL that uses the "wet" dip-coating process
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Mesoporous silica-coated silver nanoparticles (Ag@MSN) were prepared by a two step synthesis in an environment friendly way. Arginine and glucose were used as a catalyst for the formation of silica and as a reducing agent for silver ions, respectively, in
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