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387649

Sigma-Aldrich

N,N-Diisopropylethylamine

purified by redistillation, 99.5%

Synonym(s):

N-Ethyldiisopropylamine, DIPEA, Ethyldiisopropylamine, ‘Hünig’s base’

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About This Item

Linear Formula:
[(CH3)2CH]2NC2H5
CAS Number:
Molecular Weight:
129.24
EC Number:
MDL number:
UNSPSC Code:
12352100
PubChem Substance ID:
NACRES:
NA.21

vapor pressure

31 mmHg ( 37.7 °C)

Quality Level

Assay

99.5%

form

liquid

purified by

redistillation

refractive index

n20/D 1.414 (lit.)

bp

127 °C (lit.)

mp

<−50 °C (lit.)

solubility

water: soluble 4.01 g/L at 20 °C

density

0.742 g/mL at 25 °C (lit.)

SMILES string

CCN(C(C)C)C(C)C

InChI

1S/C8H19N/c1-6-9(7(2)3)8(4)5/h7-8H,6H2,1-5H3

InChI key

JGFZNNIVVJXRND-UHFFFAOYSA-N

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General description

N,N-diisopropylethylamine is an aliphatic sterically hindered amine.

Application

N,N-diisopropylethylamine may be used in the following processes:
  • As an organic base in the synthesis of indenopyrones.
  • As an activator for chiral iridium N, P ligand complexes which can be utilized in the hydrogenation of α,β-unsaturated nitriles.
  • As a non-nucleophilic base for substitution reaction.
  • As a starting material in the preparation of bis[1,2]dithiolo[1,4]thiazines and bis[1,2]dithiolopyrroles.

Signal Word

Danger

Hazard Classifications

Acute Tox. 3 Inhalation - Acute Tox. 4 Oral - Aquatic Chronic 2 - Eye Dam. 1 - Flam. Liq. 2 - STOT SE 3

Target Organs

Respiratory system

Storage Class Code

3 - Flammable liquids

WGK

WGK 2

Flash Point(F)

49.1 °F

Flash Point(C)

9.5 °C

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

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Enantioselective N-heterocyclic carbene-catalyzed synthesis of indenopyrones.
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Asymmetric Hydrogenation of α, β-Unsaturated Nitriles with Base-Activated Iridium N, P Ligand Complexes.
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Sequential Michael Addition and Enamine-Promoted Inverse Electron Demanding Diels-Alder Reaction upon 3-Vinyl-1,2,4-triazine Platforms.
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Selective Syntheses of Bis [1, 2] dithiolo [1, 4] thiazines and Bis [1, 2] dithiolopyrroles from Hunig's Base.
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