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651818

Sigma-Aldrich

Gold etchant, standard

Synonym(s):

Antistrumin, Potassium monoiodide

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About This Item

CAS Number:
MDL number:
UNSPSC Code:
12352302
NACRES:
NA.23

composition

volatiles, 50-80%

bp

100 °C (lit.)
100 °C/1 atm

solubility

H2O: miscible

density

1.2924 g/mL at 25 °C (lit.)

InChI

1S/HI.K/h1H;/q;+1/p-1

InChI key

NLKNQRATVPKPDG-UHFFFAOYSA-M

General description

Etching readily controlled with minimum undercutting. Room temperature operated. Cyanide-free for standard applications. Etch rate of 28 angstrom/sec @ 25 °C.
Gold etchant is a combination of potassium iodide and iodine as complexing agents synthesized by electrochemically oxidizing gold.

Application

Gold etchant is a selective general-purpose etchant for gold, compatible with negative and positive photoresists. It is used to etch out gold (Au) electrodes prior to scanning electron microscopy (SEM) imaging for morphological study and metal layer for the preparation of nanoelectrodes array. Gold etchant can also be used in metal assisted chemical etching (MACE) for the fabrication of p-n junction silicon nanopillar based solar cells.

Pictograms

Health hazard

Signal Word

Danger

Hazard Statements

Precautionary Statements

Hazard Classifications

STOT RE 1 Oral

Target Organs

Thyroid

Storage Class Code

6.1D - Non-combustible acute toxic Cat.3 / toxic hazardous materials or hazardous materials causing chronic effects

WGK

WGK 3

Flash Point(F)

Not applicable

Flash Point(C)

Not applicable

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

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Kim J et al.
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High performance nanopillars array silicon solar cells.
Design, Test, Integration and Packaging of MEMS/MOEMS (DTIP), 117(10), 1-5 (2013)
Cyanide-and thiourea-free electrochemical etching of gold for microelectronics applications.
Hu Z and Ritzdorf T
Journal of the Electrochemical Society, 154(10), D543-D549 (2007)
A two-step annealing process for enhancing the ferroelectric properties of poly (vinylidene fluoride)(PVDF) devices.
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Protocols

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

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