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268259

Sigma-Aldrich

Nickel

foil, thickness 0.125 mm, ≥99.9%

Synonym(s):

Ni

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About This Item

Empirical Formula (Hill Notation):
Ni
CAS Number:
Molecular Weight:
58.69
EC Number:
MDL number:
UNSPSC Code:
12161600
PubChem Substance ID:
NACRES:
NA.22

Assay

≥99.9%

form

foil

reaction suitability

core: nickel
reagent type: catalyst

resistivity

6.97 μΩ-cm, 20°C

thickness

0.125 mm

bp

2732 °C (lit.)

mp

1453 °C (lit.)

density

8.9 g/mL at 25 °C (lit.)

SMILES string

[Ni]

InChI

1S/Ni

InChI key

PXHVJJICTQNCMI-UHFFFAOYSA-N

Application

Common applications of Nickel in synthetic chemistry:
  • High-quality graphene films can be synthesized on nickel foil by rapid thermal chemical vapor deposition.
  • Nickel foil can be used as a substrate to grow piezoelectric thin films of Pb(Zr,Ti)O3 (PZT).
  • Nickel oxide nanowires can be synthesized by calcining nickel foil after soaking in lithium hydroxide solution.
  • Manganese dioxide can be electrodeposited on a nickel foil for fabricating thin film ultracapacitors.

Quantity

150g ~13 x (100x100mm)
25g ~2 x (100x100mm)

Pictograms

Health hazardExclamation mark

Signal Word

Danger

Hazard Statements

Hazard Classifications

Carc. 2 - Skin Sens. 1 - STOT RE 1

Storage Class Code

6.1D - Non-combustible acute toxic Cat.3 / toxic hazardous materials or hazardous materials causing chronic effects

WGK

WGK 2

Flash Point(F)

Not applicable

Flash Point(C)

Not applicable

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

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Synthesis of high-quality graphene films on nickel foils by rapid thermal chemical vapor deposition.
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{001} Oriented piezoelectric films prepared by chemical solution deposition on Ni foils.
Yeo HG and Trolier-McKinstry S.
Journal of Applied Physics, 116(1), 014105-014105 (2014)
Novel electrode materials for thin?film ultracapacitors: comparison of electrochemical properties of sol?gel?derived and electrodeposited manganese dioxide.
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