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Merck

252271

Sigma-Aldrich

α-Bromoisobutyryl bromide

98%

Sinónimos:

2-Bromo-2-methylpropionyl bromide, BIBB

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About This Item

Fórmula lineal:
(CH3)2CBrCOBr
Número de CAS:
Peso molecular:
229.90
Beilstein/REAXYS Number:
1746128
EC Number:
MDL number:
UNSPSC Code:
12352100
PubChem Substance ID:
NACRES:
NA.22

Quality Level

assay

98%

form

liquid

refractive index

n20/D 1.507 (lit.)

bp

162-164 °C (lit.)

density

1.86 g/mL at 25 °C (lit.)

functional group

acyl bromide
bromo

SMILES string

CC(C)(Br)C(Br)=O

InChI

1S/C4H6Br2O/c1-4(2,6)3(5)7/h1-2H3

InChI key

YOCIJWAHRAJQFT-UHFFFAOYSA-N

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General description

BIBB is an important reagent in the synthesis of amides, macrocyclic amides, ketenes, and alkynic ketones.

Application

α-Bromoisobutyryl bromide has been used:
  • as atom transfer radical polymerization (ATRP) initiator for functionalization of hydroxyl groups present on the surface of graphene oxide
  • to form an N-protected halodienamide which provided four- and five-membered lactams in the presence of copper (I) and a tertiary amine
  • in preparation of polycaprolactone macroinitiator via reaction with oligomeric caprolactone diol and mesoporous silica nanoparticles with ATRP initiator anchored on the exterior surface

pictograms

Corrosion

signalword

Danger

hcodes

Hazard Classifications

Eye Dam. 1 - Skin Corr. 1B

Storage Class

8A - Combustible corrosive hazardous materials

wgk_germany

WGK 3

flash_point_f

>230.0 °F

flash_point_c

> 110 °C

ppe

Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter


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eEROS (Encyclopedia of Reagents for Organic Synthesis) (2001)

Protocolos

ARGET ATRP procedure facilitates PMMA polymer brush growth with surface cleaning and initiator monolayer deposition.

ARGET ATRP procedure facilitates PMMA polymer brush growth with surface cleaning and initiator monolayer deposition.

ARGET ATRP procedure facilitates PMMA polymer brush growth with surface cleaning and initiator monolayer deposition.

ARGET ATRP procedure facilitates PMMA polymer brush growth with surface cleaning and initiator monolayer deposition.

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