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  • Planar Perovskite Solar Cells with High Open-Circuit Voltage Containing a Supramolecular Iron Complex as Hole Transport Material Dopant.

Planar Perovskite Solar Cells with High Open-Circuit Voltage Containing a Supramolecular Iron Complex as Hole Transport Material Dopant.

Chemphyschem : a European journal of chemical physics and physical chemistry (2018-04-27)
Yasemin Saygili, Silver-Hamill Turren-Cruz, Selina Olthof, Bartholomeus Wilhelmus Henricus Saes, Ilknur Bayrak Pehlivan, Michael Saliba, Klaus Meerholz, Tomas Edvinsson, Shaik M Zakeeruddin, Michael Grätzel, Juan-Pablo Correa-Baena, Anders Hagfeldt, Marina Freitag, Wolfgang Tress
摘要

In perovskite solar cells (PSCs), the most commonly used hole transport material (HTM) is spiro-OMeTAD, which is typically doped by metalorganic complexes, for example, based on Co, to improve charge transport properties and thereby enhance the photovoltaic performance of the device. In this study, we report a new hemicage-structured iron complex, 1,3,5-tris(5'-methyl-2,2'-bipyridin-5-yl)ethylbenzene Fe(III)-tris(bis(trifluoromethylsulfonyl)imide), as a p-type dopant for spiro-OMeTAD. The formal redox potential of this compound was measured as 1.29 V vs. the standard hydrogen electrode, which is slightly (20 mV) more positive than that of the commercial cobalt dopant FK209. Photoelectron spectroscopy measurements confirm that the iron complex acts as an efficient p-dopant, as evidenced in an increase of the spiro-OMeTAD work function. When fabricating planar PSCs with the HTM spiro-OMeTAD doped by 5 mol % of the iron complex, a power conversion efficiency of 19.5 % (AM 1.5G, 100 mW cm-2 ) is achieved, compared to 19.3 % for reference devices with FK209. Open circuit voltages exceeding 1.2 V at 1 sun and reaching 1.27 V at 3 suns indicate that recombination at the perovskite/HTM interface is low when employing this iron complex. This work contributes to recent endeavors to reduce recombination losses in perovskite solar cells.

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Sigma-Aldrich
4-叔丁基吡啶, 98%
Sigma-Aldrich
四(二甲基氨基)锡 (IV), 99.9% trace metals basis