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651788

Sigma-Aldrich

Negative resist developer I

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About This Item

UNSPSC Code:
12352300
NACRES:
NA.23
Pricing and availability is not currently available.

Quality Level

100

bp

129-138 °C (lit.)

density

0.89 g/mL at 25 °C (lit.)

storage temp.

2-8°C

General description

Available as part of Negative Photoresist kit 654892

Signal Word

Danger

Hazard Classifications

Acute Tox. 4 Dermal - Acute Tox. 4 Inhalation - Aquatic Chronic 3 - Asp. Tox. 1 - Eye Irrit. 2 - Flam. Liq. 3 - Repr. 1B - Skin Irrit. 2 - STOT RE 2 Inhalation - STOT SE 3

Target Organs

Central nervous system,Liver,Kidney, Respiratory system

Storage Class Code

3 - Flammable liquids

WGK

WGK 2

Flash Point(F)

78.8 °F - closed cup

Flash Point(C)

26 °C - closed cup

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Choose from one of the most recent versions:

Certificates of Analysis (COA)

Lot/Batch Number
MKCR3314
MKCM9003
MKCM0934
MKCL8147
MKCH5861

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Protocols

Negative Photoresist Procedure

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

Negative Photoresist Procedure

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

Negative Photoresist Procedure

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

Negative Photoresist Procedure

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

Questions

  1. Can I use this developer with the photoresist SU8-2?

    1 answer

    1. The technical bulletin for negative photoresist procedures indicates that the developer corresponding to this product is suitable for use with the SU8-2 type of photoresist.
      https://www.sigmaaldrich.com/deepweb/assets/sigmaaldrich/product/documents/345/019/al_techbull_al217.pdf

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