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490407

Sigma-Aldrich

Chloropentamethyldisilane

97%

Synonym(s):

1-Chloro-1,1,2,2,2-pentamethyldisilane, Chlorodimethyl(trimethylsilyl)silane, Chloropentamethyldisilane, Pentamethylchlorodisilane

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About This Item

Linear Formula:
(CH3)3SiSi(CH3)2Cl
CAS Number:
Molecular Weight:
166.80
EC Number:
MDL number:
UNSPSC Code:
12352300
PubChem Substance ID:
NACRES:
NA.23

Assay

97%

form

liquid

refractive index

n20/D 1.4415 (lit.)

bp

134-136 °C (lit.)

density

0.862 g/mL at 25 °C (lit.)

SMILES string

C[Si](C)(C)[Si](C)(C)Cl

InChI

1S/C5H15ClSi2/c1-7(2,3)8(4,5)6/h1-5H3

InChI key

GJCAUTWJWBFMFU-UHFFFAOYSA-N

Application

Chloropentamethyldisilane may be used as one of the constituents for the sythesis of silyloxyjulolidine (SiN1) as a source of silyl radicals which may be used as photoinitiators for free radical photopolymerization. It may also be used in the preparation of 2-pentamethyldisilanyloxymethyl)phenylpentamethyldisilane.

Pictograms

FlameCorrosion

Signal Word

Danger

Hazard Statements

Hazard Classifications

Flam. Liq. 3 - Skin Corr. 1B

Supplementary Hazards

Storage Class Code

3 - Flammable liquids

WGK

WGK 3

Flash Point(F)

102.2 °F - closed cup

Flash Point(C)

39 °C - closed cup

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

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Silyloxyamines as sources of silyl radicals: ESR spin-trapping, laser flash photolysis investigation, and photopolymerization ability.
Versace DL, et al.
Journal of Physical Organic Chemistry, 24(4), 342-350 (2011)
Photoinduced Rearrangement Reaction of 2-(Pentamethyldisilanyloxymethyl) phenylpentamethyldisilane.
Park SK and Gong SY
Bull. Korean Chem. Soc., 31(3), 731-734 (2010)
Silyloxyamines as sources of silyl radicals: ESR spin-trapping, laser flash photolysis investigation, and photopolymerization ability.
Versace DL, et al.
Journal of Physical Organic Chemistry, 24(4), 342-350 (2011)

Articles

atomic layer deposition (ALD), microelectronics, Mo:Al2O3 films, nanocomposite coating, photovoltaics, semiconductor devices, W:Al2O3 films, composite films, layer-by-layer

Hybrid organic-inorganic sol-gel materials containing silica were first called “ORMOSILs” in 1984.

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