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651761

Sigma-Aldrich

Negative resist remover I

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About This Item

UNSPSC Code:
12352300
NACRES:
NA.23

shelf life

1 yr (cool area away from direct sunlight)

Quality Level

100

pH

<2 (20 °C)

bp

204-304 °C (lit.)

density

1.00 g/mL at 25 °C (lit.)

storage temp.

2-8°C

General description

Available as part of Negative Photoresist kit 654892
Low pH formulation for removal of photoresist cured onto various substrates. Non-corrosive to metals and oxides. Does not contain chlorinated hydrocarbons, chromates, phenol, or phosphates. Performs well at room and elevated temperatures.

Signal Word

Danger

Hazard Statements

H302,H304,H314,H351,H411

Hazard Classifications

Acute Tox. 4 Oral - Aquatic Chronic 2 - Asp. Tox. 1 - Carc. 2 - Eye Dam. 1 - Skin Corr. 1

Storage Class Code

8A - Combustible corrosive hazardous materials

WGK

WGK 3

Flash Point(F)

204.8 °F

Flash Point(C)

96 °C

Choose from one of the most recent versions:

Certificates of Analysis (COA)

Lot/Batch Number
MKCR8695
MKCN0261
MKCM9918
MKCK5971
MKCK1587

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Protocols

Negative Photoresist Procedure

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

Negative Photoresist Procedure

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

Negative Photoresist Procedure

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

Negative Photoresist Procedure

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.

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