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About This Item
Linear Formula:
XeF2
CAS Number:
Molecular Weight:
169.29
EC Number:
MDL number:
UNSPSC Code:
12352300
PubChem Substance ID:
Recommended Products
vapor pressure
3.8 mmHg ( 25 °C)
mp
129 °C (lit.)
density
4.32 g/mL at 25 °C (lit.)
SMILES string
F[Xe]F
InChI
1S/F2Xe/c1-3-2
InChI key
IGELFKKMDLGCJO-UHFFFAOYSA-N
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Application
Very useful fluorination agent.
Signal Word
Danger
Hazard Statements
Precautionary Statements
Hazard Classifications
Acute Tox. 1 Inhalation - Acute Tox. 3 Oral - Eye Dam. 1 - Ox. Sol. 2 - Skin Corr. 1B
Storage Class Code
5.1B - Oxidizing hazardous materials
WGK
WGK 3
Flash Point(F)
Not applicable
Flash Point(C)
Not applicable
Personal Protective Equipment
dust mask type N95 (US), Eyeshields, Gloves
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Fluorination with XeF(2).(1) 44. Effect of Geometry and Heteroatom on the Regioselectivity of Fluorine Introduction into an Aromatic Ring.
Marko Zupan et al.
The Journal of organic chemistry, 63(3), 878-880 (2001-10-24)
Minseob Kim et al.
Nature chemistry, 2(9), 784-788 (2010-08-24)
The application of pressure, internal or external, transforms molecular solids into extended solids with more itinerant electrons to soften repulsive interatomic interactions in a tight space. Examples include insulator-to-metal transitions in O(2), Xe and I(2), as well as molecular-to-non-molecular transitions
Ariela W Kaspi et al.
Inorganic chemistry, 47(1), 5-7 (2007-12-07)
Palladium(II) aryliodo complexes bearing chelating diphosphine ligands react with XeF2, giving iodoarene and rare palladium(II) difluoro complexes. The reaction is general with regard to the aryl group, with even C6F5-I undergoing facile reductive elimination from a Pd center.
S S Nabiev
Spectrochimica acta. Part A, Molecular and biomolecular spectroscopy, 56A(8), 1589-1611 (2000-07-25)
Raman spectra of XeF4 and XeF6 in the nonaqueous HF solutions at various concentrations and vibrational spectra of the [XeF5]+ cation in the solid state and in the HF solutions over a wide range of vibrational frequencies have been studied.
Tsung Yi Chiang et al.
Journal of synchrotron radiation, 17(1), 69-74 (2009-12-24)
The synchrotron radiation (SR) stimulated etching of silicon elastomer polydimethylsiloxane (PDMS) using XeF(2) as an etching gas has been demonstrated. An etching system with differential pumps and two parabolic focusing mirrors was constructed to perform the etching. The PDMS was
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