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Merck

394505

Sigma-Aldrich

Xenon difluoride

99.99% trace metals basis

Sinónimos:

Xenon Fluoride (XeF2)

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About This Item

Fórmula lineal:
XeF2
Número de CAS:
Peso molecular:
169.29
EC Number:
MDL number:
UNSPSC Code:
12352300
PubChem Substance ID:
NACRES:
NA.23

vapor pressure

3.8 mmHg ( 25 °C)

assay

99.99% trace metals basis

form

crystals

mp

129 °C (lit.)

density

4.32 g/mL at 25 °C (lit.)

SMILES string

F[Xe]F

InChI

1S/F2Xe/c1-3-2

InChI key

IGELFKKMDLGCJO-UHFFFAOYSA-N

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General description

Xenon fluoride may be obtained by interacting elemental xenon and fluorine in the temperature range of 473-523 oC and 5 absolute atmosphere. Xenon difluoride readily interacts with Lewis acid and forms complexes.

Application

Very useful fluorination agent. Xenon fluoride may be used as a fluorinating agent to analyze sulphur, selenium and tellurium by gas chromatography.

Packaging

Packaged in PFA/FEP bottles

signalword

Danger

Hazard Classifications

Acute Tox. 1 Inhalation - Acute Tox. 3 Oral - Eye Dam. 1 - Ox. Sol. 2 - Skin Corr. 1B

Storage Class

5.1B - Oxidizing hazardous materials

wgk_germany

WGK 3

flash_point_f

Not applicable

flash_point_c

Not applicable

ppe

Eyeshields, Faceshields, Gloves, type P3 (EN 143) respirator cartridges


Certificados de análisis (COA)

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Use of Xenon difluoride for the determination of sulfur, selenium and tellurium as the volatile fluorides by gas chromatography
Aleinikov NN, et al.
Russian Chemical Bulletin, 22(11), 2552-2554 (1973)
Infrared spectra of complex compounds of xenon difluoride with ruthenium pentafluoride
Prusakov VN, et al.
Journal of Applied Spectroscopy, 17(1), 920-922 (1972)
Fluorination with XeF(2).(1) 44. Effect of Geometry and Heteroatom on the Regioselectivity of Fluorine Introduction into an Aromatic Ring.
Marko Zupan et al.
The Journal of organic chemistry, 63(3), 878-880 (2001-10-24)
Tsung Yi Chiang et al.
Journal of synchrotron radiation, 17(1), 69-74 (2009-12-24)
The synchrotron radiation (SR) stimulated etching of silicon elastomer polydimethylsiloxane (PDMS) using XeF(2) as an etching gas has been demonstrated. An etching system with differential pumps and two parabolic focusing mirrors was constructed to perform the etching. The PDMS was
S S Nabiev
Spectrochimica acta. Part A, Molecular and biomolecular spectroscopy, 56A(8), 1589-1611 (2000-07-25)
Raman spectra of XeF4 and XeF6 in the nonaqueous HF solutions at various concentrations and vibrational spectra of the [XeF5]+ cation in the solid state and in the HF solutions over a wide range of vibrational frequencies have been studied.

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