M2133

4-Methylumbelliferyl N-acetyl-β-D-glucosaminide

β-N-acetylhexosaminidase substrate, fluorogenic, ≥98% (TLC), powder

• Synonym(s): 4-Methylumbelliferyl-2-acetamido-2-deoxy-β-D-gluco­pyrano­side
• Empirical Formula (Hill Notation): C₁₈H₂₁NO₈
• CAS Number: 37067-30-4
• Molecular Weight: 379.36
• EC Number: 253-333-0
• UNSPSC Code: 12352204
• PubChem Substance ID: 24896605
• NACRES: NA.32

Properties

• product name: 4-Methylumbelliferyl N-acetyl-β-D-glucosaminide, β-N-acetylhexosaminidase substrate
• Assay: ≥98% (TLC)
• form: powder
• solubility: DMF: 20 mg/mL, clear, colorless to faintly yellow
• storage temp.: −20°C
• SMILES string: CC(=O)N[C@@H]1[C@@H](O)[C@H](O)[C@@H](CO)O[C@H]1Oc2ccc3C(C)=CC(=O)Oc3c2
• InChI: 1S/C18H21NO8/c1-8-5-14(22)26-12-6-10(3-4-11(8)12)25-18-15(19-9(2)21)17(24)16(23)13(7-20)27-18/h3-6,13,15-18,20,23-24H,7H2,1-2H3,(H,19,21)/t13-,15-,16-,17-,18?/m1/s1
• InChI key: QCTHLCFVVACBSA-XWEABGILSA-N

Description

General description

4-Methylumbelliferyl N-acetyl-β-D-glucosaminide (4-MUF-NAG) contains chitin monomer, N-acetyl-D-glucosamine (NAG) and a 4-methylumbelliferone (7-hydroxy-4-methylcoumarin) (4-MUF) moiety.

Application

4-Methylumbelliferyl N-acetyl-β-D-glucosaminide has been used as a substrate for assaying

• β-N-acetylglucosaminidase (NAGase) from soil samples
• chitinase from Fusarium oxysporum using fluorimetric assay
• β-N-acetylhexosaminidases from Arabidopsis thaliana roots and leaves samples

Biochem/physiol Actions

4-Methylumbelliferyl N-acetyl-β-D-glucosaminide (4-MUF-NAG) is a synthetic fluorogenic substrate for N-acetyl-β-D-glucosaminidase (NAGase). The enzyme functionality is assessed by its ability to hydrolyze the N-acetyl-D-glucosamine (NAG) residue in 4-MUF-NAG. 4-MUF-NAG is also a substrate for Chitinase and N-acetylhexosaminidase.

Substrates

Fluorogenic substrate for β-N-acetylhexosaminidase

Safety Information

• Storage Class Code: 11 - Combustible Solids
• WGK: WGK 3
• Flash Point(F): Not applicable
• Flash Point(C): Not applicable
• Personal Protective Equipment: dust mask type N95 (US), Eyeshields, Gloves